Aniruddha Konar

High-mobility and low-power thin-film transistors based on multilayer MoS2 crystals

Unlike graphene, the existence of bandgaps (1-2 eV) in the layered semiconductor molybdenum disulphide, combined with mobility enhancement by dielectric engineering, offers an attractive possibility of using single-layer molybdenum disulphide field-effect transistors in low-power switching devices. However, the complicated process of fabricating single-layer molybdenum disulphide with an additional high-k dielectric layer may significantly limit its compatibility with commercial fabrication. Here we show the first comprehensive investigation of process-friendly multilayer molybdenum disulphide field-effect transistors to demonstrate a compelling case for their applications in thin-film transistors. Our multilayer molybdenum disulphide field-effect transistors exhibited high mobilities (>100 cm(2) V(-1) s(-1)), near-ideal subthreshold swings (~70 mV per decade) and robust current saturation over a large voltage window. With simulations based on Shockleys long-channel transistor model and calculations of scattering mechanisms, these results provide potentially important implications in the fabrication of high-resolution large-area displays and further scientific investigation of various physical properties expected in other layered semiconductors.

High-detectivity multilayer MoS(2) phototransistors with spectral response from ultraviolet to infrared.

Phototransistors based on multilayer MoS(2) crystals are demonstrated with a wider spectral response and higher photoresponsivity than single-layer MoS(2) phototransistors. Multilayer MoS(2) phototransistors further exhibit high room temperature mobilities (>70 cm(2) V(-1) s(-1) ), near-ideal subthreshold swings (~70 mV decade(-1) ), low operating gate biases (<5 V), and negligible shifts in the threshold voltages during illumination.

Carrier statistics and quantum capacitance of graphene sheets and ribbons

In this work, fundamental results for carrier statistics in graphene two-dimensional sheets and nanoscale ribbons are derived. Though the behavior of intrinsic carrier densities in two-dimennsional graphene sheets is found to differ drastically from traditional semiconductors, very narrow (sub-10nm) ribbons are found to be similar to traditional narrow-gap semiconductors. The quantum capacitance, an important parameter in the electrostatic design of devices, is derived for both two-dimensional graphene sheets and nanoribbons.

Enhancement of Carrier Mobility in Semiconductor Nanostructures by Dielectric Engineering

We propose a technique for achieving large improvements in carrier mobilities in 2- and 1-dimensional semiconductor nanostructures by modifying their dielectric environments. We show that by coating the nanostructures with high-kappa dielectrics, scattering from Coulombic impurities can be strongly damped. Though screening is also weakened, the damping of Coulombic scattering is much larger, and the resulting improvement in mobilities of carriers can be as much as an order of magnitude for thin 2D semiconductor membranes, and more for semiconductor nanowires.

Transistors with chemically synthesized layered semiconductor WS2 exhibiting 105 room temperature modulation and ambipolar behavior

We report the realization of field-effect transistors (FETs) made with chemically synthesized multilayer crystal semiconductor WS2. The Schottky-barrier FETs demonstrate ambipolar behavior and a high (∼105×) on/off current ratio at room temperature with current saturation. The behavior is attributed to the presence of an energy bandgap in the ultrathin layered semiconductor crystal material. The FETs also show clear photo response to visible light. The promising electronic and optical characteristics of the devices combined with the chemical synthesis, and flexibility of layered semiconductor crystals such as WS2 make them attractive for future electronic and optical devices.

Effect of high-{kappa} gate dielectrics on charge transport in graphene-based field effect transistors

The effect of various dielectrics on charge mobility in single layer graphene is investigated. By calculating the remote optical phonon scattering arising from the polar substrates, and combining it with their effect on Coulombic impurity scattering, a comprehensive picture of the effect of dielectrics on charge transport in graphene emerges. It is found that though high-κ dielectrics can strongly reduce Coulombic scattering by dielectric screening, scattering from surface phonon modes arising from them wash out this advantage. By comparing the room-temperature transport properties with narrow-bandgap III-V semiconductors, strategies to improve the mobility in single layer graphene are outlined.

Mobility in semiconducting graphene nanoribbons: Phonon, impurity, and edge roughness scattering

The transport properties of carriers in semiconducting graphene nanoribbons are studied by comparing the effects of phonon, impurity, and line-edge roughness scattering. It is found that scattering from impurities located at the surface of nanoribbons and from acoustic phonons are as important as line-edge roughness scattering. The relative importance of these scattering mechanisms varies with the temperature, Fermi-level location, and the width of the ribbons. Based on the analysis, strategies for improvement of low-field mobility are described.

Polarization effects on gate leakage in InAlN/AlN/GaN high-electron-mobility transistors

Lattice-matched InAlN/AlN/GaN high electron mobility transistors offer high performance with attractive electronic and thermal properties. For high-voltage applications, gate leakage currents under reverse bias voltages remain a serious challenge. This current flow is dominated by field enhanced thermal emission from trap states or direct tunneling. We experimentally measure reverse-bias gate leakage currents in InAlN/AlN/GaN transistors at various temperatures and find that the conventional trap-assisted Frenkel-Poole model fails to explain the experimental data. Unlike the non-polar semiconductors Si, Ge, large polarization-induced electric fields exist in III-nitride heterojunctions. When the large polarization fields are accounted for, a modified Frenkel-Poole model is found to accurately explain the measured data at low reverse bias voltages. At high reverse bias voltages, we identify that the direct Fowler-Nordheim tunneling mechanism dominates. The accurate identification of the gate leakage curren...

Charge transport in non-polar and semi-polar III-V nitride heterostructures

Compared to the intense research focus on the optical properties, the transport properties in non-polar and semi-polar III-nitride semiconductors remain relatively unexplored to date. The purpose of this paper is to discuss charge-transport properties in non-polar and semi-polar orientations of GaN in a comparative fashion to what is known for transport in polar orientations. A comprehensive approach is adopted, starting from an investigation of the differences in the electronic bandstructure along different polar orientations of GaN. The polarization fields along various orientations are then discussed, followed by the low-field electron and hole mobilities. A number of scattering mechanisms that are specific to non-polar and semi-polar GaN heterostructures are identified, and their effects are evaluated. Many of these scattering mechanisms originate due to the coupling of polarization with disorder and defects in various incarnations depending on the crystal orientation. The effect of polarization orientation on carrier injection into quantum-well light-emitting diodes is discussed. This paper ends with a discussion of orientation-dependent high-field charge-transport properties including velocity saturation, instabilities and tunneling transport. Possible open problems and opportunities are also discussed.

Tailoring the carrier mobility of semiconductor nanowires by remote dielectrics

The dielectric environment of thin semiconductor nanowires can affect the charge transport properties inside the wire. In this work, it is shown that Coulomb impurity scattering in thin nanowires can be damped strongly by coating the wire with a high-κ dielectric. This leads to an increase in the mobility of free charges inside the wire and can be used as a post-growth technique to improve the conductivity of thin nanowires.