Annette G. Johncock

Low pressure microwave glow discharge process for high deposition rate amorphous silicon alloy

As glow discharge amorphous silicon alloys become more important for commercial production of photovoltaic, xerographic, optical sensing, and microelectronic devices, economic considerations have motivated considerable research aimed at increasing deposition rate and gas utilization efficiency. Recently, a low pressure microwave glow discharge process was reported (1) which produces good quality a-Si:F:H films, with essentially 100% gas utilization at deposition rates > 100A/sec.