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Asano Takeshi

Shin-Etsu Chemical

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Publication

Featured researches published by Asano Takeshi.

Archive | 2005

SACRIFICIAL FILM FORMING COMPOSITION, PATTERN FORMING METHOD, SACRIFICIAL FILM AND METHOD FOR REMOVING THE SAME

Hamada Yoshitaka; Ogihara Tsutomu; Iwabuchi Motoaki; Asano Takeshi; Ueda Takafumi; Pfeiffer Dirk

Archive | 2004

Composition for forming porous film, porous film and its manufacturing process, interlayer dielectrics and semiconductor device

Ogihara Tsutomu; Yagihashi Fujio; Hamada Yoshitaka; Asano Takeshi; Iwabuchi Motoaki; Nakagawa Hideo; Sasago Masaru

Archive | 2008

COMPOSITION FOR FORMING INTER-SEMICONDUCTOR-LAYER INSULATING FILM, METHOD FOR MANUFACTURING THE SAME, FILM FORMING METHOD, AND SEMICONDUCTOR DEVICE

Yagihashi Fujio; Hamada Yoshitaka; Asano Takeshi; Ogiwara Tsutomu; Iwabuchi Motoaki; Nakagawa Hideo; Sasako Masaru

Archive | 2009

ORGANIC SILICON OXIDE-BASED FINE PARTICLE AND METHOD FOR PRODUCING THE SAME, COMPOSITION FOR FORMING POROUS MEMBRANE, POROUS MEMBRANE AND METHOD FOR FORMING THE SAME, AS WELL AS SEMICONDUCTOR DEVICE

Hamada Yoshitaka; Yagihashi Fujio; Asano Takeshi; Nakagawa Hideo; Sasako Masaru

Archive | 2004

ANTI-REFLECTION FILM MATERIAL BASED ON SUBSTITUTED SILICON-CONTAINING COMPOUND, ANTI-REFLECTION FILM USING THE SAME AND PATTERNING METHOD USING THE SAME

Asano Takeshi; Iwabuchi Motoaki; Ogihara Tsutomu; Yagihashi Fujio

Archive | 2010

HIGH-TEMPERATURE RESISTIVE ADHESIVE COMPOSITION, ADHESION METHOD FOR SUBSTRATE, AND 3-DIMENSIONAL SEMICONDUCTOR DEVICE

Hamada Yoshitaka; Yagihashi Fujio; Asano Takeshi

Archive | 2008

SILOXANE POLYMER, METHOD FOR PRODUCING THE SAME, COATING LIQUID FOR FORMING POROUS FILM CONTAINING THE POLYMER, POROUS FILM AND SEMICONDUCTOR APPARATUS USING THE POROUS FILM

Yagihashi Fujio; Hamada Yoshitaka; Asano Takeshi; Iwabuchi Motoaki; Nakagawa Hideo; Sasako Masaru

Archive | 2004

ANTI-REFLECTION FILM MATERIAL HAVING HIGH ETCHING SELECTIVITY TO RESIST, ANTI-REFLECTION FILM USING THE SAME AND PATTERNING METHOD USING THE SAME

Asano Takeshi; Iwabuchi Motoaki; Ogihara Tsutomu; Yagihashi Fujio

Archive | 2007

SILICON-CONTAINING FILM FORMING COMPOSITION FOR ETCHING MASK, SILICON-CONTAINING FILM FOR ETCHING MASK, AND SUBSTRATE PROCESSING INTERMEDIATE AND PROCESSED SUBSTRATE PROCESSING METHOD USING THE SAME

Ogiwara Tsutomu; Asano Takeshi; Iwabuchi Motoaki; Ueda Takashi

Archive | 2008

COMPOSITIONS FOR FORMING FILM, INSULATING FILM HAVING LOW DIELECTRIC CONSTANT, METHOD FOR FORMING INSULATING FILM HAVING LOW DIELECTRIC CONSTANT AND SEMICONDUCTOR APPARATUS

Hamada Yoshitaka; Yagihashi Fujio; Asano Takeshi; Nakagawa Hideo; Sasako Masaru

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Collaboration

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Iwabuchi Motoaki

Shin-Etsu Chemical

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Yagihashi Fujio

Shin-Etsu Chemical

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Ogihara Tsutomu

Shin-Etsu Chemical

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Nakagawa Hideo

Panasonic

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Ueda Takafumi

Shin-Etsu Chemical

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Sasago Masaru

Panasonic

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