Atsunori Terasaki

Position measurement method for alignment in UV imprint using a high index mold and “electronic” moiré technique

In UV imprint, positioning errors can occur between a mold and a wafer due to pressure when there is a contact with the UV resin. The moire technique, which is produced by superimposition of two gratings, is a well-known and simple method for high-resolution position measurement. However, the authors believe that a direct observation of two separate gratings is more appropriate for higher positioning accuracy. Here they propose a new method for the position measurement, which obtains “electronic” moire fringes by combining the images of two separate gratings from different areas of the mold and the wafer. The fundamental detection error was σ=0.15nm. The repeatabilities of the total system was σ=0.68nm in air and σ=0.73nm in resin. The linearity of the measurement value to control signal was R2=0.97.

Investigation of Dual-Focal-Points Optical System with Bright-Field Illumination and Image Processing for UV Nanoimprint Alignment

In this study, a new wide-gap alignment technique was developed for the investigation of dual-focal-points optical system with bright field illumination and image processing for UV nanoimprint.