Ayako Nakano

Semiconductor device, method for making pattern layout, method for making mask pattern, method for making layout, method for manufacturing photo mask, photo mask, and method for manufacturing semiconductor device

Light intensity distribution simulation system, light intensity distribution simulation method, mask pattern correcting method, and light intensity distribution simulation program

Data processing method in semiconductor device, program of the same, and manufacturing method of semiconductor device

Lithography simulation method, mask pattern correction method, and susbtrate topography correction method

Semiconductor device pattern creation method, pattern data processing method, pattern data processing program, and semiconductor device manufacturing method

Polarization analyzing system, exposure method, and method for manufacturing semiconductor device

Pattern forming method and system, and method of manufacturing a semiconductor device

Method of and computer program product for designing patterns, and method of manufacturing semiconductor device

Semiconductor device pattern creation method, pattern data processing program, and semiconductor device manufacturing method

Method for processing design data of semiconductor device, program therefor, and method for manufacturing semiconductor device