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Dive into the research topics where B. B. Burton is active.

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Featured researches published by B. B. Burton.


Journal of Applied Physics | 2010

Steady-state and transient photoconductivity in c-axis GaN nanowires grown by nitrogen-plasma-assisted molecular beam epitaxy

Norman A. Sanford; Paul T. Blanchard; Kristine A. Bertness; Lorelle Mansfield; John B. Schlager; Aric W. Sanders; Alexana Roshko; B. B. Burton; Steven M. George

Analysis of steady-state and transient photoconductivity measurements at room temperature performed on c-axis oriented GaN nanowires yielded estimates of free carrier concentration, drift mobility, surface band bending, and surface capture coefficient for electrons. Samples grown (unintentionally n-type) by nitrogen-plasma-assisted molecular beam epitaxy primarily from two separate growth runs were examined. The results revealed carrier concentration in the range of (3–6)×1016 cm−3 for one growth run, roughly 5×1014–1×1015 cm−3 for the second, and drift mobility in the range of 500–700 cm2/(V s) for both. Nanowires were dispersed onto insulating substrates and contacted forming single-wire, two-terminal structures with typical electrode gaps of ≈3–5 μm. When biased at 1 V bias and illuminated at 360 nm (3.6 mW/cm2) the thinner (≈100 nm diameter) nanowires with the higher background doping showed an abrupt increase in photocurrent from 5 pA (noise level) to 0.1–1 μA. Under the same conditions, thicker (151...


Chemistry of Materials | 2008

Molecular Layer Deposition of Alucone Polymer Films Using Trimethylaluminum and Ethylene Glycol

Arrelaine Dameron; Dragos Seghete; B. B. Burton; Stephen Davidson; Andrew S. Cavanagh; Jacob A. Bertrand; Steven M. George


Journal of Physical Chemistry C | 2008

Gas Diffusion Barriers on Polymers Using Multilayers Fabricated by Al2O3 and Rapid SiO2 Atomic Layer Deposition

Arrelaine Dameron; Stephen Davidson; B. B. Burton; Peter Francis Carcia; R. Scott McLean; Steven M. George


Journal of Physical Chemistry C | 2009

SiO2 Atomic Layer Deposition Using Tris(dimethylamino)silane and Hydrogen Peroxide Studied by in Situ Transmission FTIR Spectroscopy

B. B. Burton; Sun-Ho Kang; Shi-Woo Rhee; Steven M. George


Thin Solid Films | 2009

Atomic layer deposition of MnO using Bis(ethylcyclopentadienyl)manganese and H2O

B. B. Burton; F. H. Fabreguette; Steven M. George


Journal of Physical Chemistry C | 2009

Atomic Layer Deposition of MgO Using Bis(ethylcyclopentadienyl)magnesium and H2O

B. B. Burton; D. N. Goldstein; Steven M. George


Chemistry of Materials | 2008

Rapid SiO2 Atomic Layer Deposition Using Tris(tert-pentoxy)silanol

B. B. Burton; M. P. Boleslawski; A. T. Desombre; Steven M. George


Archive | 2008

Protective coatings for organic electronic devices made using atomic layer deposition and molecular layer deposition techniques

Steven M. George; Arrelaine Dameron; B. B. Burton; Markus D. Groner


Nanotechnology | 2008

Passivation of pigment-grade TiO2 particles by nanothick atomic layer deposited SiO2 films

David M. King; Xinhua Liang; B. B. Burton; M. Kamal Akhtar; Alan W. Weimer


7th International Conference on Nitride Semiconductors | 2007

Persistent photoconductivity studies of c-axis GaN nanowires grown by MBE

Norman A. Sanford; Paul T. Blanchard; Kristine A. Bertness; Alexana Roshko; B. B. Burton; Lorelle Mansfield; John B. Schlager; Steven M. George; Aric W. Sanders

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Steven M. George

University of Colorado Boulder

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Arrelaine Dameron

National Renewable Energy Laboratory

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Alexana Roshko

National Institute of Standards and Technology

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Aric W. Sanders

National Institute of Standards and Technology

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John B. Schlager

National Institute of Standards and Technology

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Kristine A. Bertness

National Institute of Standards and Technology

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Lorelle Mansfield

National Institute of Standards and Technology

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Norman A. Sanford

National Institute of Standards and Technology

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Paul T. Blanchard

National Institute of Standards and Technology

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Alan W. Weimer

University of Colorado Boulder

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