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Becker Moritz

Carl Zeiss AG

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Featured researches published by Becker Moritz.

Archive | 2011

Reflective optical element for use in extreme UV lithography device for extreme UV wavelength region, has reflective surface comprising upper ruthenium oxide layer, ruthenium layer, silicon nitride layer and silicon layer

Ehm Dirk Heinrich; Storm Arnoldus Jan; Becker Moritz

Archive | 2014

Verfahren und Vorrichtung zur Bestimmung der Kontamination von Oberflächen

Diesch Jovana-Maria; Foca Eugen; Becker Moritz; Roos Matthias; Ehm Dirk Heinrich; Nagel Mona

Archive | 2012

Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage

Loering Ulrich; Kamenov Vladimir; Ehm Dirk Heinrich; Schmidt Stefan-Wolfgang; Becker Moritz; Wurmbrand Andreas

Archive | 2011

Collector used in projection exposure system, for aligning extreme UV (EUV) radiation of EUV laser plasma source, has sub unit whose passage opening feeds material from plasma source feed device and adapts to scattering of trajectories

Ehm Dirk Heinrich; Becker Moritz; Schmidt Stefan-Wolfgang; Butscher Vera Dr

Archive | 2018

Detektoranordnung und Verfahren zur Bestimmung der Intensität elektromagnetischer Strahlung in einem optischen System

Ament Irene; Ehm Dirk Heinrich; Schmidt Stefan-Wolfgang; Becker Moritz; Wiesner Stefan; Vogel Diana

Archive | 2018

Reflektives optisches Element für die EUV-Lithographie

Ehm Dirk Heinrich; Shklover Vitaliy; Ament Irene; Schmidt Stefan-Wolfgang; Becker Moritz; Wiesner Stefan; Vogel Diana

Archive | 2018

REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY

Ehm Dirk Heinrich; Shklover Vitaliy; Ament Irene; Schmidt Stefan-Wolfgang; Becker Moritz; Wiesner Stefan; Urich Diana; Meier Robert; Winter Ralf; Jalics Christof; Kierey Holger; Eva Eric

Archive | 2017

Verfahren zum Aufbringen einer Deckschicht und reflektives optisches Element

Llliberi Andrea; Ehm Dirk Heinrich; Roozeboom Fred; Becker Moritz; Sligte Edwin Te

Archive | 2017

Projektionsbelichtungsanlage für die Halbleiterlithographie mit Elementen zur Plasmakonditionierung

Ament Irene; Ehm Dirk Heinrich; Schmidt Stefan-Wolfgang; Becker Moritz; Wiesner Stefan; Vogel Diana

Archive | 2017

PROJECTION EXPOSURE SYSTEM FOR SEMICONDUCTOR LITHOGRAPHY, COMPRISING ELEMENTS FOR PLASMA CONDITIONING

Ament Irene; Ehm Dirk Heinrich; Schmidt Stefan Wolfgang; Becker Moritz; Wiesner Stefan; Vogel Diana

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Ehm Dirk Heinrich

Carl Zeiss AG

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Schmidt Stefan-Wolfgang

Carl Zeiss AG

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Ament Irene

Carl Zeiss AG

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Wiesner Stefan

Carl Zeiss AG

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Roos Matthias

Carl Zeiss AG

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Ahles Florian

Carl Zeiss AG

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Akbarinia Alireza

Carl Zeiss AG

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Baumann Thomas

Carl Zeiss AG

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Butscher Vera Dr

Carl Zeiss AG

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Diesch Jovana-Maria

Carl Zeiss AG

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