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Schmidt Stefan-Wolfgang

Carl Zeiss AG

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Publication

Featured researches published by Schmidt Stefan-Wolfgang.

Archive | 2011

Optische Anordnung, insbesondere in einer Projektionsbelichtungsanlage für die EUV-Lithographie

Ehm Dirk Heinrich; Schmidt Stefan-Wolfgang; Dengel Guenther

Archive | 2010

EUV-Lithographieanlage und Kabel dafür

Fischer Holger; Ehm Dirk Heinrich; Schmidt Stefan-Wolfgang; Kraus Dieter

Archive | 2010

Measuring system for determining the position of a reflective optical component in a micro-lithography projection illumination facility has a unit as a source of light to measure rays

Ehm Dirk Heinrich; Kampen Maarten Van; Schmidt Stefan-Wolfgang; Moors Johannes Hubertus Josephina; Horn Jan

Archive | 2017

EUV Lithography System And Operating Method

Ehm Dirk Heinrich; Schmidt Stefan-Wolfgang; Osorio Edgar; Te Sligte Edwin; Zellenrath Mark; Logtenberg Hella

Archive | 2013

PROJECTION EXPOSURE APPARATUS

Ehm Dirk Heinrich; Schmidt Stefan-Wolfgang; Dier Oliver

Archive | 2012

Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage

Loering Ulrich; Kamenov Vladimir; Ehm Dirk Heinrich; Schmidt Stefan-Wolfgang; Becker Moritz; Wurmbrand Andreas

Archive | 2011

Collector used in projection exposure system, for aligning extreme UV (EUV) radiation of EUV laser plasma source, has sub unit whose passage opening feeds material from plasma source feed device and adapts to scattering of trajectories

Ehm Dirk Heinrich; Becker Moritz; Schmidt Stefan-Wolfgang; Butscher Vera Dr

Archive | 2010

Optical arrangement i.e. extreme UV lithography system, has screen arranged in vacuum housing, and comprising guide surface for guiding trapped atomic hydrogen in direction of optical surface

Fischer Holger; Ehm Dirk Heinrich; Schmidt Stefan-Wolfgang

Archive | 2018

Detektoranordnung und Verfahren zur Bestimmung der Intensität elektromagnetischer Strahlung in einem optischen System

Ament Irene; Ehm Dirk Heinrich; Schmidt Stefan-Wolfgang; Becker Moritz; Wiesner Stefan; Vogel Diana

Archive | 2018

Reflektives optisches Element für die EUV-Lithographie

Ehm Dirk Heinrich; Shklover Vitaliy; Ament Irene; Schmidt Stefan-Wolfgang; Becker Moritz; Wiesner Stefan; Vogel Diana

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Ehm Dirk Heinrich

Carl Zeiss AG

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Becker Moritz

Carl Zeiss AG

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Ament Irene

Carl Zeiss AG

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Wiesner Stefan

Carl Zeiss AG

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Fischer Holger

Carl Zeiss AG

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Logtenberg Hella

Carl Zeiss AG

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Kraus Dieter

Carl Zeiss AG

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Osorio Edgar

Carl Zeiss AG

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Te Sligte Edwin

Carl Zeiss AG

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Zellenrath Mark

Carl Zeiss AG

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