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Ehm Dirk Heinrich

Carl Zeiss AG

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Publication

Featured researches published by Ehm Dirk Heinrich.

Archive | 2012

Verfahren zur Korrektur der Oberflächenform eines Spiegels

Mueller Juergen; Schicketanz Thomas; Ehm Dirk Heinrich

Archive | 2014

Optical element and optical system for EUV lithography, and method for treating such an optical element

Bekman Hermanus Hendricus Petrus Theodorus; Ehm Dirk Heinrich; Huijbregtse Jeroen; Storm Arnoldus Jan; Graber Tina; Ament Irene; Smeets Dries; Te Sligte Edwin; Kuznetsov Alexey

Archive | 2011

Optische Anordnung, insbesondere in einer Projektionsbelichtungsanlage für die EUV-Lithographie

Ehm Dirk Heinrich; Schmidt Stefan-Wolfgang; Dengel Guenther

Archive | 2012

Mirror for projection lens of micro-lithographic projection exposure system, has local shape variation element that is formed in functional coating layer for correcting surface shape of mirror

Ehm Dirk Heinrich; Stickel Franz-Josef; Mueller Juergen

Archive | 2011

Reflective optical element for use in extreme UV lithography device for extreme UV wavelength region, has reflective surface comprising upper ruthenium oxide layer, ruthenium layer, silicon nitride layer and silicon layer

Ehm Dirk Heinrich; Storm Arnoldus Jan; Becker Moritz

Archive | 2010

Detektion von kontaminierenden Stoffen in einer EUV-Lithographieanlage

Kraus Dieter; Ehm Dirk Heinrich; Schmidt Stefan

Archive | 2010

MIRROR FOR GUIDING PENCIL OF LIGHT RAYS

Waldis Severin; Bach Florian; Benz Daniel; Werber Armin; Noell Wilfried; Ehm Dirk Heinrich; Wiesner Stefan; Krauth Dieter

Archive | 2010

EUV-Lithographieanlage und Kabel dafür

Fischer Holger; Ehm Dirk Heinrich; Schmidt Stefan-Wolfgang; Kraus Dieter

Archive | 2010

Measuring system for determining the position of a reflective optical component in a micro-lithography projection illumination facility has a unit as a source of light to measure rays

Ehm Dirk Heinrich; Kampen Maarten Van; Schmidt Stefan-Wolfgang; Moors Johannes Hubertus Josephina; Horn Jan

Archive | 2009

METHOD FOR REMOVING A CONTAMINATION LAYER FROM AN OPTICAL SURFACE, METHOD FOR GENERATING A CLEANING GAS, AND CORRESPONDING CLEANING AND CLEANING GAS GENERATION ARRANGEMENTS

Storm Arnold; Ehm Dirk Heinrich; Moors Johannes Hubertus Josephina; Wolschrijn Bastiaan Theodoor; Stein Thomas; Te Sligte Edwin

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Schmidt Stefan-Wolfgang

Carl Zeiss AG

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Becker Moritz

Carl Zeiss AG

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Kraus Dieter

Carl Zeiss AG

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Ament Irene

Carl Zeiss AG

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Wiesner Stefan

Carl Zeiss AG

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Wolschrijn Bastiaan Theodoor

Carl Zeiss AG

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Moors Johannes Hubertus Josephina

Carl Zeiss AG

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Storm Arnoldus Jan

Carl Zeiss AG

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Te Sligte Edwin

Carl Zeiss AG

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Fischer Holger

Carl Zeiss AG

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