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Bernhard Poschenrieder

Siemens

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Publication

Featured researches published by Bernhard Poschenrieder.

Archive | 1995

Avoidance of pattern shortening by using off axis illumination with dipole and polarizing apertures

Bernhard Poschenrieder; Takashi Sato; Tsukasa Azuma

Archive | 1996

Avoidance of pattern shortening by using an off axis illumination with twisting dipole and polarizing apertures

Bernhard Poschenrieder; Takashi Sato; Tsukasa Azuma

Archive | 1995

Formation of self-aligned overlapping bitline contacts with sacrificial polysilicon fill-in stud

Virinder Grewal; Bernhard Poschenrieder

Archive | 1997

Mask removal for etching a DRAM capacitor trench

Karl Müller; Bernhard Poschenrieder; Klaus Roithner

Archive | 1996

Single wafer tool comprising an in-situ wafer temperature control apparatus

Isahiro Hasegawa; Karl Paul Muller; Bernhard Poschenrieder; Hans-Joerg Timme; Kessel Theodore Van

Archive | 1997

Gas distributing plate for reaction chamber

Karl Paul Muller; Bernhard Poschenrieder; Klaus Roithner; パウル ムラー カール; ロイトナー クラウス; ポッシェンリーダー ベルンハルト

Archive | 1996

Method of forming self-aligned contact holes using a sacrificial polysilicon layer

Virinder Grewal; Bernhard Poschenrieder

Archive | 1997

Distribution plate for a reaction chamber

Karl Paul Muller; Bernhard Poschenrieder; Klaus Roithner

Archive | 2002

A process for dry-etching a semiconductor wafer surface

Peter Kirchhof; Bernhard Poschenrieder; Virinder Grewal; Thomas Morgenstern; Jens Stolze; Gabriele Fichtl

Archive | 1999

DRAM cell with trench capacitor

Erwin Hammerl; Jack A. Mandelman; Alvin P. Short; Reinhard Johannes Stengl; H O L Herbert; Bernhard Poschenrieder; Radhika Srinivasan

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Collaboration

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Karl Paul Muller

IBM

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Klaus Roithner

IBM

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Virinder Grewal

Siemens

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Takashi Sato

Toshiba

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Tsukasa Azuma

Toshiba

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Thomas Morgenstern

Infineon Technologies

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Jens Stolze

Infineon Technologies

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Reinhard Johannes Stengl

Siemens

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Takashi Sato

Toshiba

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Tsukasa Azuma

Toshiba

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