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Biagio Gallo

Applied Materials

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Publication

Featured researches published by Biagio Gallo.

Archive | 2003

Plasma immersion ion implantation process using a capacitively coupled plasma source having low dissociation and low minimum plasma voltage

Kenneth S. Collins; Hiroji Hanawa; Kartik Ramaswamy; Andrew Nguyen; Amir Al-Bayati; Biagio Gallo; Gonzalo Antonio Monroy

Archive | 2005

Plasma immersion ion implantation process

Kenneth S. Collins; Hiroji Hanawa; Kartik Ramaswamy; Andrew Nguyen; Amir Al-Bayati; Biagio Gallo

Archive | 2005

Semiconductor substrate process using a low temperature-deposited carbon-containing hard mask

Kartik Ramaswamy; Hiroji Hanawa; Biagio Gallo; Kenneth S. Collins; Kai Ma; Vijay Parihar; Dean Jennings; Abhilash J. Mayur; Amir Al-Bayati; Andrew Nguyen

Archive | 2003

Plasma immersion ion implantation apparatus including a plasma source having low dissociation and low minimum plasma voltage

Kenneth S. Collins; Hiroji Hanawa; Kartik Ramaswamy; Andrew Nguyen; Amir Al-Bayati; Biagio Gallo; Gonzalo Antonio Monroy

Archive | 2004

Semiconductor on insulator vertical transistor fabrication and doping process

Amir Al-Bayati; Kenneth S. Collins; Hiroji Hanawa; Kartik Ramaswamy; Biagio Gallo; Andrew Nguyen

Archive | 2004

Method for ion implanting insulator material to reduce dielectric constant

Amir Al-Bayati; Rick J. Roberts; Kenneth S. Collins; Ken Macwilliams; Hiroji Hanawa; Kartik Ramaswamy; Biagio Gallo; Andrew Nguyen

Archive | 2004

Fabrication of silicon-on-insulator structure using plasma immersion ion implantation

Dan Maydan; Randir P. S. Thakur; Kenneth S. Collins; Amir Al-Bayati; Hiroji Hanawa; Kartik Ramaswamy; Biagio Gallo; Andrew Nguyen

Archive | 2004

RF measurement feedback control and diagnostics for a plasma immersion ion implantation reactor

Kenneth S. Collins; Hiroji Hanawa; Kartik Ramaswamy; Amir Al-Bayati; Andrew Nguyen; Biagio Gallo

Archive | 2004

Very low temperature CVD process with independently variable conformality, stress and composition of the CVD layer

Hiroji Hanawa; Kartik Ramaswamy; Kenneth S. Collins; Amir Al-Bayati; Biagio Gallo; Andrew Nguyen

Archive | 2004

Silicon-on-insulator wafer transfer method using surface activation plasma immersion ion implantation for wafer-to-wafer adhesion enhancement

Amir Al-Bayati; Kenneth S. Collins; Hiroji Hanawa; Kartik Ramaswamy; Biagio Gallo; Andrew Nguyen

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Collaboration

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Kartik Ramaswamy

Applied Materials

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Hiroji Hanawa

Applied Materials

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Kenneth S. Collins

Applied Materials

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Amir Al-Bayati

Applied Materials

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Andrew Nguyen

University of Utah

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Abhilash J. Mayur

Applied Materials

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Dean Jennings

Applied Materials

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Kai Ma

Applied Materials

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Vijay Parihar

Applied Materials

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Majeed A. Foad

Applied Materials

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