Hiroji Hanawa | Researchain

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Featured researches published by Hiroji Hanawa.

Archive | 1996

Symmetric tunable inductively coupled HDP-CVD reactor

Fred C. Redeker; Farhad Moghadam; Hiroji Hanawa; Tetsuya Ishikawa; Dan Maydan; Shijian Li; Brian Lue; Robert J. Steger; Manus Wong; Yaxin Wong; Ashok K. Sinha

Archive | 2003

Plasma immersion ion implantation process using a capacitively coupled plasma source having low dissociation and low minimum plasma voltage

Kenneth S. Collins; Hiroji Hanawa; Kartik Ramaswamy; Andrew Nguyen; Amir Al-Bayati; Biagio Gallo; Gonzalo Antonio Monroy

Archive | 2004

Chemical vapor deposition plasma process using plural ion shower grids

Hiroji Hanawa; Tsutomu Tanaka; Kenneth S. Collins; Amir Al-Bayati; Kartik Ramaswamy; Andrew Nguyen

Archive | 2000

Inductive plasma loop enhancing magnetron sputtering

Shaoher X. Pan; Hiroji Hanawa; John C. Forster; Fusen Chen

Archive | 1997

Multi-zone RF inductively coupled source configuration

Hiroji Hanawa; Tetsuya Ishikawa; Manus Wong; Shijian Li; Kaveh F. Niazi; Kenneth Smyth; Fred C. Redeker; Troy S. Detrick; Dee Pinson Ii Jay

Archive | 1997

RF plasma reactor with hybrid conductor and multi-radius dome ceiling

Gerald Zheyao Yin; Diana Xiaobing Ma; Peter K. Loewenhardt; Philip M. Salzman; Allen Zhao; Hiroji Hanawa

Archive | 2005

Plasma immersion ion implantation process

Kenneth S. Collins; Hiroji Hanawa; Kartik Ramaswamy; Andrew Nguyen; Amir Al-Bayati; Biagio Gallo

Archive | 1997

Automatic frequency tuning of an RF plasma source of an inductively coupled plasma reactor

Hiroji Hanawa

Archive | 1993

High frequency semiconductor wafer processing apparatus and method

Donald M. Mintz; Hiroji Hanawa; Sasson Somekh; Dan Maydan; Kenneth S. Collins

Archive | 2005

Semiconductor substrate process using a low temperature-deposited carbon-containing hard mask

Kartik Ramaswamy; Hiroji Hanawa; Biagio Gallo; Kenneth S. Collins; Kai Ma; Vijay Parihar; Dean Jennings; Abhilash J. Mayur; Amir Al-Bayati; Andrew Nguyen

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