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Buskirk Peter Van

Siemens

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Publication

Featured researches published by Buskirk Peter Van.

Archive | 1998

Method for selectively depositing bismuth based ferroelectric films

Frank Hintermaier; Bryan Hendrix; Jeffrey R. Roeder; Buskirk Peter Van; T. H. Baum

Archive | 2013

Precursor composition, method for delivering precursor composition, and method for forming lead zirconate titanate (pzt) film

Buskirk Peter Van; バスカーク，ピーター，シー． ヴァン; Jeffrey F. Roeder; ローダー，ジェフリー，エフ．; Steven M. Bilodeau; ビロデュー，スティーブン，エム．; Michael W. Russell; ラッセル，マイケル，ダブリュ．; Stephen T. Johnston; ジョンストン，スティーブン，ティー．; Daniel J. Vestyck; ベスティック，ダニエル，ジェイ．; Thomas H. Baum; バーム，トーマス，エイチ．

Archive | 2000

Film mince modifiable en titanate de plomb-zirconium, procede de depot, et structures de memoires ferroelectriques contenant ce film

Buskirk Peter Van; Jeffrey F. Roeder; Steven M. Bilodeau; Michael W. Russell; Stephen T. Johnston; Daniel J. Vestyck; Thomas H. Baum

Archive | 2000

Modifizierbares bleizirkontitanat-dünnschichtmaterial, abscheidemethode und ferroelektrische speicherstrukuren aus diesem dünnschichtmaterial

Thomas H. Baum; Steven M. Bilodeau; Stephen T. Johnston; Jeffrey F. Roeder; Michael W. Russell; Buskirk Peter Van; Daniel J. Vestyck

Archive | 1999

Polissage chimico-mecanique de condensateurs au feram

Buskirk Peter Van; Michael W. Russell; Steven M. Bilodeau; Thomas H. Baum

Archive | 1999

Cvd processes using bi aryl

Frank Hintermaier; Buskirk Peter Van; Jeffrey F. Roeder; Bryan C. Hendrix; Thomas H. Baum; Debra A. Desrochers

Archive | 1998

A method for applying ferroelectric thin films

Buskirk Peter Van; R Roeder; Frank Hintermaier; Bryan C. Hendrix; H Baum

Archive | 1998

Verfahren zur cvd bei niedrigen temperaturen unter verwendung von bi-carboxylaten

Thomas H. Baum; Debra A. Desrochers; Bryan C. Hendrix; Frank Hintermaier; Jeffrey R. Roeder; Buskirk Peter Van

Archive | 1998

A method for CVD at low temperatures using bi-carboxylates

H. Thomas Baum; A. Debra Desrochers; Bryan C. Hendrix; Frank Hintermaier; R. Jeffrey Roeder; Buskirk Peter Van

Archive | 1998

Verfahren zur cvd bei niedrigen temperaturen unter verwendung von bi-carboxylaten A method for CVD at low temperatures using bi-carboxylates

H. Thomas Baum; A. Debra Desrochers; Bryan C. Hendrix; Frank Hintermaier; R. Jeffrey Roeder; Buskirk Peter Van

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Collaboration

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Frank Hintermaier

Infineon Technologies

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Bryan C. Hendrix

Infineon Technologies

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Thomas H. Baum

IBM

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Jeffrey F. Roeder

Infineon Technologies

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Debra A. Desrochers

Infineon Technologies

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Christine Dehm

Infineon Technologies

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Wolfgang Hoenlein

Infineon Technologies

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Michael W. Russell

Cornell University

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Jeffrey R. Roeder

Siemens

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Jeffrey F. Roeder

Infineon Technologies

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