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Dive into the research topics where Cetin Kaya is active.

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Featured researches published by Cetin Kaya.


IEEE Transactions on Electron Devices | 1995

Effects of erase source bias on Flash EPROM device reliability

K.T. San; Cetin Kaya; T. P. Ma

This paper is concerned with the effects of the source bias during the erase operation on the reliability of Flash EPROM devices. It will be shown that positive charge in the tunnel oxide, mostly generated by the erase operation, is a major cause of the unintentional charge losdgain mechanisms that disturb the data content of the memory cell. The effects of the erase source bias will be evaluated in the context of the positive oxide charge generation and the resulting enhancement of the gate current that causes the data loss. An optimal source bias during erase, around 2 V for our samples, will be shown to cause the least positive oxide charge. A model based on the band-to-band tunneling-induced hole generation in Si and subsequent hole injection during the erase operation will be presented and discussed.


IEEE Electron Device Letters | 1992

A new technique for determining the capacitive coupling coefficients in flash EPROMs

K.T. San; Cetin Kaya; David K. Liu; T. P. Ma; P. Shah

A method for determining the capacitive coupling coefficients of flash erasable programmable read only memories (EPROMs) is introduced. This technique relies on the Fowler-Nordheim erase measurements and source/drain junction leakage characteristics of the device to extract the control gate, source, and drain coupling coefficients. An advantage offered by this method is its use of an actual flash EPROM cell without requiring additional test structures.<<ETX>>


IEEE Electron Device Letters | 1992

Buried source-side injection (BSSI) for flash EPROM programming

Cetin Kaya; David K. Liu; J. Paterson; P. Shah

A flash-EPROM cell structure that can be programmed at low drain voltages and low power is disclosed. The new element in the device structure is the incorporation of buried junction at the source side where the high electric field region is established during programming. The cell is programmed by hot-electron injection at the source side and erased by Fowler-Nordheim tunneling at the drain side. Typical programming time of 10 mu s/byte can be accomplished with 3.5 V on the drain junction. The structure can be built with the standard EPROM technology and can offer advantages in low-voltage power supply systems such as portable and notebook computers.<<ETX>>


international symposium on power semiconductor devices and ic's | 2012

Reverse-recovery safe operating area of diodes in power integrated circuits

Phil Hower; Cetin Kaya; Sameer Pendharkar; Clif Jones

Failure during reverse recovery of an IC power diode is examined. It is shown how one-dimensional diode behavior together with mixed-mode tcad can be used to predict safe operating conditions for the actual two-dimensional case.


Archive | 1993

Method of using source bias to increase threshold voltages and/or to correct for over-erasure of flash eproms

Cetin Kaya; Wayland B. Holland; Rabah Mezenner


Archive | 1991

Method of making a non-volatile memory cell

Cetin Kaya; David K. Liu


Archive | 1994

Method and circuitry for programming floating-gate memory cell using a single low-voltage supply

John F. Schreck; Cetin Kaya; David J. Mcelroy


Archive | 1995

Non-volatile memory cell structure and process for forming same

Cetin Kaya; Howard L. Tigelaar


Archive | 1991

Split-gate cell for an EEPROM

Gill Manzur; Rana Lahiry; Cetin Kaya


Archive | 1991

Split metal plate capacitor and method for making the same

Cetin Kaya; Howard L. Tigelaar

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