Cheng-Hung Shih

InGaN/GaN single-quantum-well microdisks

We have grown In{sub x}Ga{sub 1-x}N/GaN quantum wells atop GaN microdisk with {gamma}-LiAlO{sub 2} substrate by using plasma-assisted molecular beam epitaxy. The structural and optical properties of the samples were analyzed by transmission electron microscopy, x-ray diffraction, cathodoluminescence, and photoluminescence measurements. Based on the measured results, we obtained the indium concentration of the In{sub x}Ga{sub 1-x}N/GaN single quantum well to be x = 0.25 with a band-gap energy of 2.31 eV, which is consistent with the bowing effect of bulk In{sub x}Ga{sub 1-x}N: E{sub g}(x) = [3.42 - x * 2.65 - x * (1 - x) * 2.4] eV.

Green light emission by InGaN/GaN multiple-quantum-well microdisks

The high-quality In{sub x}Ga{sub 1−x}N/GaN multiple quantum wells were grown on GaN microdisks with γ-LiAlO{sub 2} substrate by using low-temperature two-step technique of plasma-assisted molecular beam epitaxy. We demonstrated that the hexagonal GaN microdisk can be used as a strain-free substrate to grow the advanced In{sub x}Ga{sub 1−x}N/GaN quantum wells for the optoelectronic applications. We showed that the green light of 566-nm wavelength (2.192 eV) emitted from the In{sub x}Ga{sub 1−x}N/GaN quantum wells was tremendously enhanced in an order of amplitude higher than the UV light of 367-nm wavelength (3.383 eV) from GaN.

Microstructure of non-polar GaN on LiGaO2 grown by plasma-assisted MBE.

We have investigated the structure of non-polar GaN, both on the M - and A-plane, grown on LiGaO2 by plasma-assisted molecular beam epitaxy. The epitaxial relationship and the microstructure of the GaN films are investigated by transmission electron microscopy (TEM). The already reported epi-taxial relationship and for M -plane GaN is confirmed. The main defects are threading dislocations and stacking faults in both samples. For the M -plane sample, the density of threading dislocations is around 1 × 1011 cm-2 and the stacking fault density amounts to approximately 2 × 105 cm-1. In the A-plane sample, a threading dislocation density in the same order was found, while the stacking fault density is much lower than in the M -plane sample.

Self-confined GaN heterophased quantum wells

Wurtzite/zinc-blende/wurtzite GaN heterophased quantum wells (QWs) were grown by plasma-assisted molecular beam epitaxy. A self-assembling mechanism was used to simulate the heterophased QW, in which a wurtzite/zinc-blende phase transition was created by rotating the threefold symmetric N-Ga vertical bond 60°. The GaN heterophased QW was attested by transmission electron microscopy, selective area electron diffraction and cathodoluminescence measurements.

Electrical contact for wurtzite GaN microdisks

We developed a back processing to fabricate an electrical contact of wurtzite GaN microdisk on transparent p-type GaN template. The interface welding between the GaN microdisk and p-type GaN template produced a very solid and secure epi-film contact for the electrical current passing through, with a resistance of 45.0 KΩ and threshold voltage of 5.9 V. The back processing can resolve the obstacle of electrical contacts for self-assembled wurtzite nano-devices.

Growth and Characteristics of High-quality InN by Plasma- Assisted Molecular Beam Epitaxy

The high-quality InN epifilms and InN microdisks have been grown with InGaN buffer layers at low temperatures by plasma-assisted molecular beam epitaxy. The samples were analyzed using X-ray diffraction, scanning electron microscopy, high-resolution transmission electron microscopy, and photoluminescence. The characteristics of the InN epifilms and InN microdisks were studied, and the role of InGaN buffer was evaluated.

Growth of InGaN/GaN quantum wells with graded InGaN buffer for green-to-yellow light emitters

We have studied the growth of high-indium-content In x Ga1− x N/GaN double quantum wells (QWs) for yellow and green light emitters by plasma-assisted molecular beam epitaxy at a low substrate temperature (570 °C). By introducing a graded In y Ga1− y N buffer layer, the PL intensity of QWs can be increased sixfold compared with that of the original structure. In addition, the indium content in InGaN QWs was increased owing the prolonged growth time of the graded In y Ga1− y N buffer layer. After adjusting to optimal growth conditions, we achieved In x Ga1− x N/GaN QWs with x = 0.32. Photoluminescence measurements showed that the emission wavelength from In x Ga1− x N/GaN QWs was 560 nm (2.20 eV). The optimal condition for the gradient In y Ga1− y N buffer layer was obtained for light emission from green to yellow.

Epitaxial growth of M-plane GaN on ZnO micro-rods by plasma-assisted molecular beam epitaxy

We have studied the GaNgrown on ZnO micro-rods by plasma-assisted molecular beam epitaxy. From the analyses of GaN microstructure grown on non-polar M-plane ZnO surface ( 10 1 0 ) by scanning transmission electron microscope, we found that the ZnGa2O4 compound was formed at the M-plane hetero-interface, which was confirmed by polarization-dependent photoluminescence. We demonstrated that the M-plane ZnO micro-rod surface can be used as an alternative substrate to grow high quality M-plane GaN epi-layers.

The growth of heteroepitaxial CuInSe2 on free-standing N-polar GaN

We report that chalcopyrite CuInSe2 thin films were grown on free-standing N-polar GaN (0001) by molecular beam epitaxy. X-ray diffraction showed that the CuInSe2 thin film was grown in (112) orientation, and its peak of rocking curve with full width at half maximum of about 897.8 arc-sec indicated the epitaxial growth of CuInSe2 (112) film on N-polar GaN. Microstructure analysis of the CuInSe2  showed that the large lattice mismatch (28.5%) between CuInSe2  and GaN is accommodated by domain matching, and no interface reaction occurs between CuInSe2 and GaN. Our experimental results show that GaN is stable for the epitaxial growth of CuInSe2 thin film, which exhibits a promising potential for optoelectronic applications.

Characterization of GaN microstructures grown by plasma-assisted molecular beam epitaxy

The characterization of GaN microstructures grown by plasma-assisted molecular beam epitaxy on LiAlO2 substrate was studied by cathodoluminescence and photoluminescence measurements. We demonstrated that the cathodoluminescence from oblique semi-polar surfaces of mushroom-shaped GaN was much brighter than that from top polar surface due to the reduction of polarization field on the oblique semi-polar surfaces. It implies that the oblique semi-polar surface is superior for the light-emitting surface of wurtzite nano-devices.