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Dive into the research topics where Cheol-Ho Yu is active.

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Featured researches published by Cheol-Ho Yu.


SID Symposium Digest of Technical Papers | 2011

16.2: World-Best Performance LTPS TFTs with Robust Bending Properties on AMOLED Displays

Moojin Kim; Jun-Hyuk Cheon; Jae-Seob Lee; Yong-Hwan Park; Sung-Guk An; Tae-Woong Kim; Dong-un Jin; Hoon-Kee Min; Cheol-Ho Yu; Sungchul Kim; Jin Jang

This study reported a low temperature polycrystalline silicon LTPS thin film transistor TFT fabrication process on plastic substrates for flexible display applications. Polycrystalline silicon poly-Si films were formed by excimer laser annealing ELA method. It was found by ELA thermal simulation that there was around 70 □ on plastic surface during ELA crystallization process. The excimer laser irradiated film was analyzed by using various spectroscopic methods such as X-ray diffraction, scanning electron microscopy, and atomic force microscopy. Dehydrogenation and activation processes were performed by a conventional LTPS method without causing any plastic substrate distortion. The fabricated poly-Si TFT on a flexible backplane shows a very good performance with field effect mobility of 95.3 cm2/Vs, on/off ratio current ratio > 108, and threshold voltage of −1.6 V. Bending tests after a delamination process were also performed with TFT backplane samples.


Journal of Applied Physics | 2008

Effects of high pressure annealing on the characteristics of solid phase crystallization poly-Si thin-film transistors

Moojin Kim; Kyoung-Bo Kim; Ki-Yong Lee; Cheol-Ho Yu; Hye-Dong Kim; Ho-Kyoon Chung

Integrating circuits into organic light emitting diode displays require fabrication of polycrystalline silicon (poly-Si) based thin-film transistors (TFTs) on glass substrates. In this work we evaluated the use of high pressure annealing (HPA) process of poly-Si films in H2O atmosphere to improve TFT characteristics via reducing defect density in poly-Si films. We attempted to develop a HPA process at temperatures below 600°C without causing any glass distortion and reducing the throughput. The HPA-treated poly-Si film was analyzed using various spectroscopic methods such as Raman, x-ray photoelectron spectroscopy, and transmission electron microscope, and the evaluation of the characteristics of TFTs fabricated by such poly-Si films was made. The heating at 550°C with 1MPa H2O vapor increased the carrier mobility from 8.5to20cm2∕Vs and reduced the absolute value of the threshold voltage from 9.6to6.5V, as compared with the conventional solid phase crystallization (SPC) process. The sub-threshold swings a...


Archive | 2009

Flat panel display apparatus and method of manufacturing the same

Jong-mo Yeo; Dae-Hyun No; Do-hyun Kwon; Choong-Youl Im; Soo-Beon Jo; Sung-Won Doh; Il-Jeong Lee; Cheol-Ho Yu


Archive | 2009

Thin film transistor array arrangement, organic light emitting display device having the same, and manufacturing method thereof

Do-hyun Kwon; Choong-Youl Im; Dae-Hyun No; Il-Jeong Lee; Cheol-Ho Yu


Archive | 2010

HALFTONE MASK AND MANUFACTURING METHOD THEREOF AND METHOD FOR FORMING FILM USING THE SAME

Oh-Seob Kwon; Jae-yong Kim; Sungchul Kim; Kyoung-Bo Kim; Il-Jeong Lee; Cheol-Ho Yu; Yong-Woo Park; Han-Hee Yoon; In-young Jung


Archive | 2009

Thin film transistor array arrangement, and organic light emitting display device

Do-hyun Kwon; Choong-Youl Im; Dae-Hyun No; Il-Jeong Lee; Cheol-Ho Yu


Archive | 2013

Backplane of flat panel display and method of manufacturing the same

Jong-Yun Kim; Cheol-Ho Yu


Archive | 2011

AMRPHOUS SILICON CRYSTALLIZATION APPARATUS

Beong-Ju Kim; Ji-Su Ahn; Cheol-Ho Yu


Japanese Journal of Applied Physics | 2008

Investigation of Pattern-Induced Brightness Non-uniformity in Active-Matrix Organic Light-Emitting Diode Displays

Kyoung-Bo Kim; Hye-Hyang Park; Ohseob Kwon; Moojin Kim; Ki-Yong Lee; Yong-Woo Park; Jong-Hyun Choi; Cheol-Ho Yu; Hye-Dong Kim; Sungchul Kim; Ho-Kyoon Chung


Archive | 2016

Display panel including multilayer diffusion barrier

Jintaek Kim; Jong Yun Kim; Cheol-Ho Yu

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