Chin-An Lin

Few-Layer MoS2 with High Broadband Photogain and Fast Optical Switching for Use in Harsh Environments

Few-layered MoS2 as Schottky metal-semiconductor-metal photodetectors (MSM PDs) for use in harsh environments makes its debut as two-dimensional (2D) optoelectronics with high broadband gain (up to 13.3), high detectivity (up to ~10(10) cm Hz(1/2)/W), fast photoresponse (rise time of ~70 μs and fall time of ~110 μs), and high thermal stability (at a working temperature of up to 200 °C). Ultrahigh responsivity (0.57 A/W) of few-layer MoS2 at 532 nm is due to the high optical absorption (~10% despite being less than 2 nm in thickness) and a high photogain, which sets up a new record that was not achievable in 2D nanomaterials previously. This study opens avenues to develop 2D nanomaterial-based optoelectronics for harsh environments in imaging techniques and light-wave communications as well as in future memory storage and optoelectronic circuits.

Ultra-High-Responsivity Broadband Detection of Si Metal–Semiconductor–Metal Schottky Photodetectors Improved by ZnO Nanorod Arrays

This study describes a strategy for developing ultra-high-responsivity broadband Si-based photodetectors (PDs) using ZnO nanorod arrays (NRAs). The ZnO NRAs grown by a low-temperature hydrothermal method with large growth area and high growth rate absorb the photons effectively in the UV region and provide refractive index matching between Si and air for the long-wavelength region, leading to 3 and 2 orders of magnitude increase in the responsivity of Si metal-semiconductor-metal PDs in the UV and visible/NIR regions, respectively. Significantly enhanced performances agree with the theoretical analysis based on the finite-difference time-domain method. These results clearly demonstrate that Si PDs combined with ZnO NRAs hold high potential in next-generation broadband PDs.

Periodic Si Nanopillar Arrays Fabricated by Colloidal Lithography and Catalytic Etching for Broadband and Omnidirectional Elimination of Fresnel Reflection

Periodic Si nanopillar arrays (NPAs) were fabricated by the colloidal lithography combined with catalytic etching. By varying the size of colloidal crystals using oxygen plasma etching, Si NPAs with desirable diameter and fill factor could be obtained. The Fresnel reflection can be eliminated effectively over broadband regions by NPAs; i.e., the wavelength-averaged specular reflectance is decreased to 0.70% at wavelengths of 200-1900 nm. The reflectance is reduced greatly for the incident angles up to 70 degrees for both s- and p-polarized light. These excellent antireflection performances are attributed to light trapping effect and very low effective refractive indices, which can be modified by the fill factor of Si in the NPA layers.

Antireflection effect of ZnO nanorod arrays

We demonstrate a practical optoelectronic application of ZnO nanorod arrays (NRAs) synthesized by a hydrothermal method serving as an antireflection coating (ARC). ZnO NRAs exhibit broadband and omnidirectional AR characteristics for unpolarized, transverse electric polarized, and transverse magnetic polarized light, which arise from the length variation of NRA profiles. Due to growth on any surface of devices/substrates with ease, ZnO NRAs as the broadband and omnidirectional ARCs can benefit greatly the performance of optoelectronic devices, such as light-emitting diodes and photovoltaics.

Light scattering by nanostructured anti-reflection coatings

The correlation between surface profiles of nanostructures and the behavior of scattered light, including specular and diffuse components, is demonstrated in detail. The nanorod arrays with large alignment variation exhibit broadband and omnidirectional anti-reflection properties due to the gradual index profile. This work provides insight into further structural design for nanostructured optoelectronic applications.

Nanowire arrays with controlled structure profiles for maximizing optical collection efficiency

The nanowire array (NWA) layers with controlled structure profiles fabricated by maskless galvanic wet etching on Si substrates are found to exhibit extremely low specular reflectance (<0.1%) in the wavelengths of 200–850 nm. The significantly suppressed reflection is accompanied with other favorable antireflection (AR) properties, including omnidirectionality and polarization-insensitivity. The NWA layers are also effective in suppressing the undesired diffuse reflection. These excellent AR performances benefit from the rough interfaces between air/NWA layers and NWA layers/substrate and the decreased nanowire densities, providing the gradient of effective refractive indices. The Raman intensities of Si NWAs were enhanced by up to 400 times as compared with the signal of the polished Si, confirming that the NWA layers enhance both insertion and extraction efficiencies of light. This study provides an insight into the interaction between light and nanostructures, and should contribute to the structural optimization of various optoelectronic devices.

Subwavelength Si nanowire arrays for self-cleaning antireflection coatings

Galvanic wet etching was adopted to fabricate Si nanowire arrays (NWAs) as a near-perfect subwavelength structure (SWS), which is an optically effective gradient-index antireflection (AR) surface and also exhibits super-hydrophobicity with an extremely high water contact angle (159°). Fresnel reflection and diffuse reflection over the broad spectrum can be eliminated by a Si NWA AR coating. Moreover, Si NWA SWSs show polarization-independent and omnidirectional AR properties. The wavelength-averaged specular and diffuse reflectance of Si NWA SWSs are as low as 0.06% and 2.51%, respectively. The effects of the surface profile of this biomimetic SWS on the AR and super-hydrophobic properties were investigated systematically.

Significant efficiency enhancement of hybrid solar cells using core-shell nanowire geometry for energy harvesting.

A novel strategy employing core-shell nanowire arrays (NWAs) consisting of Si/regioregular poly(3-hexylthiophene) (P3HT) was demonstrated to facilitate efficient light harvesting and exciton dissociation/charge collection for hybrid solar cells (HSCs). We experimentally demonstrate broadband and omnidirectional light-harvesting characteristics of core-shell NWA HSCs due to their subwavelength features, further supported by the simulation based on finite-difference time domain analysis. Meanwhile, core-shell geometry of NWA HSCs guarantees efficient charge separation since the thickness of the P3HT shells is comparable to the exciton diffusion length. Consequently, core-shell HSCs exhibit a 61% improvement of short-circuit current for a conversion efficiency (η) enhancement of 31.1% as compared to the P3HT-infiltrated Si NWA HSCs with layers forming a flat air/polymer cell interface. The improvement of crystal quality of P3HT shells due to the formation of ordering structure at Si interfaces after air mass 1.5 global (AM 1.5G) illumination was confirmed by transmission electron microscopy and Raman spectroscopy. The core-shell geometry with the interfacial improvement by AM 1.5G illumination promotes more efficient exciton dissociation and charge separation, leading to η improvement (∼140.6%) due to the considerable increase in V(oc) from 257 to 346 mV, J(sc) from 11.7 to 18.9 mA/cm(2), and FF from 32.2 to 35.2%, which is not observed in conventional P3HT-infiltrated Si NWA HSCs. The stability of the Si/P3HT core-shell NWA HSCs in air ambient was carefully examined. The core-shell geometry should be applicable to many other material systems of solar cells and thus holds high potential in third-generation solar cells.

Surface effects on optical and electrical properties of ZnO nanostructures

This article presents a comprehensive review of the current research addressing the surface effects on physical properties and potential applications of nanostructured ZnO. Studies illustrating the transport, photoluminescence (PL), and photoconductivity properties of ZnO with ultrahigh surface-to-volume (S/V) ratio are reviewed first. Secondly, we examine recent studies of the applications of nanostructured ZnO employing the surface effect on gas/chemical sensing, relying on a change of conductivity via electron trapping and detrapping process at the surfaces of nanostructures. Finally, we comprehensively review the photovoltaic (PV) application of ZnO nanostructures. The ultrahigh S/V ratios of nanostructured devices suggest that studies on the synthesis and PV properties of various nanostructured ZnO for dye-sensitized solar cells (DSSCs) offer great potential for high efficiency and low-cost solar cell solutions. After surveying the current literature on the surface effects on nano-structured ZnO, we conclude this review with personal perspectives on a few surface-related issues that remain to be addressed before nanostructured ZnO devices can reach their ultimate potential as a new class of industrial applications.

Surface profile-controlled close-packed Si nanorod arrays for self-cleaning antireflection coatings

We demonstrate the fabrication of surface profile-controlled close-packed Si nanorod arrays (NRAs), using a scalable and integrated circuit compatible process combining colloidal lithography and reactive ion etching. Si NRAs exhibit broadband, omnidirectional, and polarization-insensitive antireflection (AR) properties and enhance the hydrophobicity. The effect of surface profiles of periodic NRAs on the AR and hydrophobicity was investigated systematically. The Si NRAs function as both self-cleaning and AR layers, which offer a promising approach to enhance the solar cell energy conversion efficiency.