Christina L. Porter

Quantitative Chemically Specific Coherent Diffractive Imaging of Reactions at Buried Interfaces with Few Nanometer Precision

We demonstrate quantitative, chemically specific imaging of buried nanostructures, including oxidation and diffusion reactions at buried interfaces, using nondestructive tabletop extreme ultraviolet (EUV) coherent diffractive imaging (CDI). Copper nanostructures inlaid in SiO2 are coated with 100 nm of aluminum, which is opaque to visible light and thick enough that neither visible microscopy nor atomic force microscopy can image the buried interface. Short wavelength high harmonic beams can penetrate the aluminum layer, yielding high-contrast images of the buried structures. Quantitative analysis shows that the reflected EUV light is extremely sensitive to the formation of multiple oxide layers, as well as interdiffusion of materials occurring at the metal-metal and metal-insulator boundaries deep within the nanostructure with few nanometers precision.

Ptychographic hyperspectral spectromicroscopy with an extreme ultraviolet high harmonic comb

We report a proof-of-principle demonstration of a new scheme of spectromicroscopy in the extreme ultraviolet (EUV) spectral range, where the spectral response of the sample at different wavelengths is imaged simultaneously. This scheme is enabled by combining ptychographic information multiplexing (PIM) with a tabletop EUV source based on high harmonic generation, where four spectrally narrow harmonics near 30 nm form a spectral comb structure. Extending PIM from previously demonstrated visible wavelengths to the EUV/X-ray wavelengths promises much higher spatial resolution and a more powerful spectral contrast mechanism, making PIM an attractive spectromicroscopy method in both microscopy and spectroscopy aspects. In addition to spectromicroscopy, this method images the multicolor EUV beam in situ, making this a powerful beam characterization technique. In contrast to other methods, the techniques described here use no hardware to separate wavelengths, leading to efficient use of the EUV radiation.

Spatial, spectral, and polarization multiplexed ptychography.

We introduce a novel coherent diffraction imaging technique based on ptychography that enables simultaneous full-field imaging of multiple, spatially separate, sample locations. This technique only requires that diffracted light from spatially separated sample sites be mutually incoherent at the detector, which can be achieved using multiple probes that are separated either by wavelength or by orthogonal polarization states. This approach enables spatially resolved polarization spectroscopy from a single ptychography scan, as well as allowing a larger field of view to be imaged without loss in spatial resolution. Further, we compare the numerical efficiency of the multi-mode ptychography algorithm with a single mode algorithm.

Reflection Mode Tabletop Coherent Diffraction Imaging of Buried Nanostructures

We image a nanostructured sample through a visibly-opaque 100nm layer of aluminum using lensless Fresnel Ptychography and a tabletop high harmonic source. The reconstructed amplitude-contrast image uncovered the presence of interfacial diffusion non-destructively.

Multiple beam ptychography for large field-of-view, high throughput, quantitative phase contrast imaging

The ability to record large field-of-view images without a loss in spatial resolution is of crucial importance for imaging science. For most imaging techniques however, an increase in field-of-view comes at the cost of decreased resolution. Here we present a novel extension to ptychographic coherent diffractive imaging that permits simultaneous full-field imaging of multiple locations by illuminating the sample with spatially separated, interfering probes. This technique allows for large field-of-view imaging in amplitude and phase while maintaining diffraction-limited resolution, without an increase in collected data i.e. diffraction patterns acquired.

Full-field imaging of thermal and acoustic dynamics in an individual nanostructure using tabletop high harmonic beams

We built a stroboscopic extreme UV microscope with tabletop high harmonics to make nanoscale movies of thermal and acoustic waves. Imaging charge, spin, and energy flow in materials is a current grand challenge that is relevant to a host of nanoenhanced systems, including thermoelectric, photovoltaic, electronic, and spin devices. Ultrafast coherent x-ray sources enable functional imaging on nanometer length and femtosecond timescales particularly when combined with advances in coherent imaging techniques. Here, we combine ptychographic coherent diffractive imaging with an extreme ultraviolet high harmonic light source to directly visualize the complex thermal and acoustic response of an individual nanoscale antenna after impulsive heating by a femtosecond laser. We directly image the deformations induced in both the nickel tapered nanoantenna and the silicon substrate and see the lowest-order generalized Lamb wave that is partially confined to a uniform nanoantenna. The resolution achieved—sub–100 nm transverse and 0.5-Å axial spatial resolution, combined with ≈10-fs temporal resolution—represents a significant advance in full-field dynamic imaging capabilities. The tapered nanoantenna is sufficiently complex that a full simulation of the dynamic response would require enormous computational power. We therefore use our data to benchmark approximate models and achieve excellent agreement between theory and experiment. In the future, this work will enable three-dimensional functional imaging of opaque materials and nanostructures that are sufficiently complex that their functional properties cannot be predicted.

Complex EUV imaging reflectometry: spatially resolved 3D composition determination and dopant profiling with a tabletop 13nm source

With increasingly 3D devices becoming the norm, there is a growing need in the semiconductor industry and in materials science for high spatial resolution, non-destructive metrology techniques capable of determining depth-dependent composition information on devices. We present a solution to this problem using ptychographic coherent diffractive imaging (CDI) implemented using a commercially available, tabletop 13 nm source. We present the design, simulations, and preliminary results from our new complex EUV imaging reflectometer, which uses coherent 13 nm light produced by tabletop high harmonic generation. This tool is capable of determining spatially-resolved composition vs. depth profiles for samples by recording ptychographic images at multiple incidence angles. By harnessing phase measurements, we can locally and nondestructively determine quantities such as device and thin film layer thicknesses, surface roughness, interface quality, and dopant concentration profiles. Using this advanced imaging reflectometer, we can quantitatively characterize materials-sciencerelevant and industry-relevant nanostructures for a wide variety of applications, spanning from defect and overlay metrology to the development and optimization of nano-enhanced thermoelectric or spintronic devices.

Prototype through-pellicle coherent imaging using a 30nm tabletop EUV source

We present preliminary through-pellicle imaging using a 30nm tabletop extreme ultraviolet (EUV) coherent diffractive imaging microscope. We show that even in a non-optimized setup, this technique enables through-pellicle imaging of a sample with no detectable impact on image fidelity or resolution.

Characterization and imaging of nanostructured materials using tabletop extreme ultraviolet light sources

Using a tabletop coherent extreme ultraviolet source, we extend current nanoscale metrology capabilities with applications spanning from new models of nanoscale transport and materials, to nanoscale device fabrication. We measure the ultrafast dynamics of acoustic waves in materials; by analyzing the material’s response, we can extract elastic properties of films as thin as 11nm. We extend this capability to a spatially resolved imaging modality by using coherent diffractive imaging to image the acoustic waves in nanostructures as they propagate. This will allow for spatially resolved characterization of the elastic properties of non-isotropic materials.

Sub-wavelength transmission and reflection mode tabletop imaging with 13nm illumination via ptychography CDI

EUV lithography is promising for addressing upcoming, <10nm nodes for the semiconductor industry, but with this promise comes the need for reliable metrology techniques. In particular, there is a need for actinic mask inspection in which the imaging wavelength matches that of the intended lithography process, so that the most relevant defects are detected. Here, we demonstrate tabletop, ptychographic, coherent diffraction imaging (CDI) in reflection- and transmission-modes of extended samples, using a 13 nm high harmonic generation (HHG) source. We achieve the first sub-wavelength resolution EUV image (0.9λ) in transmission, the highest spatial resolution using any 13.5 nm source to date. We also present the first reflection-mode image obtained on a tabletop using 12.7 nm light. This work represents the first 12.7 nm reflection-mode image using any source of a general sample.