Elisabeth R. Shanblatt

Tabletop nanometer extreme ultraviolet imaging in an extended reflection mode using coherent Fresnel ptychography

We demonstrate the first (to our knowledge) general purpose full-field reflection-mode extreme ultraviolet (EUV) microscope based on coherent diffractive imaging. This microscope is capable of nanoscale amplitude and phase imaging of extended surfaces at an arbitrary angle of incidence in a noncontact, nondestructive manner. We use coherent light at 29.5 nm from high-harmonic upconversion to illuminate a surface, directly recording the scatter as the surface is scanned. Ptychographic reconstruction is then combined with tilted plane correction to obtain an image with amplitude and phase information. The image quality and detail from this diffraction-limited tabletop EUV microscope compares favorably with both scanning electron microscope and atomic force microscope images. The result is a general and completely extensible imaging technique that can provide a comprehensive and definitive characterization of how light at any wavelength scatters from a surface, with imminent feasibility of elemental imaging with

High contrast 3D imaging of surfaces near the wavelength limit using tabletop EUV ptychography.

Scanning electron microscopy and atomic force microscopy are well-established techniques for imaging surfaces with nanometer resolution. Here we demonstrate a complementary and powerful approach based on tabletop extreme-ultraviolet ptychography that enables quantitative full field imaging with higher contrast than other techniques, and with compositional and topographical information. Using a high numerical aperture reflection-mode microscope illuminated by a tabletop 30 nm high harmonic source, we retrieve high quality, high contrast, full field images with 40 nm by 80 nm lateral resolution (≈1.3 λ), with a total exposure time of less than 1 min. Finally, quantitative phase information enables surface profilometry with ultra-high, 6 Å axial resolution. In the future, this work will enable dynamic imaging of functioning nanosystems with unprecedented combined spatial (<10 nm) and temporal (<10 fs) resolution, in thick opaque samples, with elemental, chemical and magnetic sensitivity.

Full field tabletop EUV coherent diffractive imaging in a transmission geometry.

We demonstrate the first general tabletop EUV coherent microscope that can image extended, non-isolated, non-periodic, objects. By implementing keyhole coherent diffractive imaging with curved mirrors and a tabletop high harmonic source, we achieve improved efficiency of the imaging system as well as more uniform illumination at the sample, when compared with what is possible using Fresnel zone plates. Moreover, we show that the unscattered light from a semi-transparent sample can be used as a holographic reference wave, allowing quantitative information about the thickness of the sample to be extracted from the retrieved image. Finally, we show that excellent tabletop image fidelity is achieved by comparing the retrieved images with scanning electron and atomic force microscopy images, and show superior capabilities in some cases.

Quantitative Chemically Specific Coherent Diffractive Imaging of Reactions at Buried Interfaces with Few Nanometer Precision

We demonstrate quantitative, chemically specific imaging of buried nanostructures, including oxidation and diffusion reactions at buried interfaces, using nondestructive tabletop extreme ultraviolet (EUV) coherent diffractive imaging (CDI). Copper nanostructures inlaid in SiO2 are coated with 100 nm of aluminum, which is opaque to visible light and thick enough that neither visible microscopy nor atomic force microscopy can image the buried interface. Short wavelength high harmonic beams can penetrate the aluminum layer, yielding high-contrast images of the buried structures. Quantitative analysis shows that the reflected EUV light is extremely sensitive to the formation of multiple oxide layers, as well as interdiffusion of materials occurring at the metal-metal and metal-insulator boundaries deep within the nanostructure with few nanometers precision.

Ptychographic hyperspectral spectromicroscopy with an extreme ultraviolet high harmonic comb

We report a proof-of-principle demonstration of a new scheme of spectromicroscopy in the extreme ultraviolet (EUV) spectral range, where the spectral response of the sample at different wavelengths is imaged simultaneously. This scheme is enabled by combining ptychographic information multiplexing (PIM) with a tabletop EUV source based on high harmonic generation, where four spectrally narrow harmonics near 30 nm form a spectral comb structure. Extending PIM from previously demonstrated visible wavelengths to the EUV/X-ray wavelengths promises much higher spatial resolution and a more powerful spectral contrast mechanism, making PIM an attractive spectromicroscopy method in both microscopy and spectroscopy aspects. In addition to spectromicroscopy, this method images the multicolor EUV beam in situ, making this a powerful beam characterization technique. In contrast to other methods, the techniques described here use no hardware to separate wavelengths, leading to efficient use of the EUV radiation.

Spatial, spectral, and polarization multiplexed ptychography.

We introduce a novel coherent diffraction imaging technique based on ptychography that enables simultaneous full-field imaging of multiple, spatially separate, sample locations. This technique only requires that diffracted light from spatially separated sample sites be mutually incoherent at the detector, which can be achieved using multiple probes that are separated either by wavelength or by orthogonal polarization states. This approach enables spatially resolved polarization spectroscopy from a single ptychography scan, as well as allowing a larger field of view to be imaged without loss in spatial resolution. Further, we compare the numerical efficiency of the multi-mode ptychography algorithm with a single mode algorithm.

Spatial, Spectral, and Polarization Multiplexed Ptychography

We demonstrate ptychographic imaging of multiple areas of a sample simultaneously with no loss of resolution, by using different wavelengths or polarizations to collect independent diffraction patterns in parallel. This significantly reduces imaging times.

Quantitative tabletop coherent diffraction imaging microscope for EUV lithography mask inspection

Coherent diffraction imaging (CDI) has matured into a versatile phase-contrast microscopy technique capable of producing diffraction limited images without the need for high precision focusing elements. CDI has been most appropriately applied in the EUV/X-ray region of the spectrum where imaging optics are both difficult to produce and inefficient. By satisfying basic geometric constraints (such as Nyquist sampling of scattered intensities) diffraction imaging techniques essentially replace any imaging elements with sophisticated computer algorithms. We demonstrate the utility of our CDI-based, phase-contrast EUV microscope by quantitatively imaging objects in both transmission and reflection. Patterned feature depth is obtained in transmission using keyhole coherent diffraction imaging (KCDI) and feature height is quantitatively extracted in the first general, table-top reflection mode CDI microscope.

Reflection Mode Tabletop Coherent Diffraction Imaging of Buried Nanostructures

We image a nanostructured sample through a visibly-opaque 100nm layer of aluminum using lensless Fresnel Ptychography and a tabletop high harmonic source. The reconstructed amplitude-contrast image uncovered the presence of interfacial diffusion non-destructively.

Multiple beam ptychography for large field-of-view, high throughput, quantitative phase contrast imaging

The ability to record large field-of-view images without a loss in spatial resolution is of crucial importance for imaging science. For most imaging techniques however, an increase in field-of-view comes at the cost of decreased resolution. Here we present a novel extension to ptychographic coherent diffractive imaging that permits simultaneous full-field imaging of multiple locations by illuminating the sample with spatially separated, interfering probes. This technique allows for large field-of-view imaging in amplitude and phase while maintaining diffraction-limited resolution, without an increase in collected data i.e. diffraction patterns acquired.