Daniel E. Adams
National Institute of Standards and Technology
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Publication
Featured researches published by Daniel E. Adams.
Optics Express | 2014
Marin Iliev; Amanda Meier; Benjamin R. Galloway; Daniel E. Adams; Jeff Squier; Charles G. Durfee
We interfere an amplified output pulse with a copy that has been converted using third-order cross-polarized wave generation. The ASE pedestal shows as a background in the interference, yielding the short-pulse/ASE energy contrast.
Metrology, Inspection, and Process Control for Microlithography XXXII | 2018
Robert Karl; Peter Johnsen; Daniel E. Adams; Henry C. Kapteyn; Margaret M. Murnane; Naoto Horiguchi; Christina L. Porter; Michael Tanksalvala; Michael Gerrity; Galen P. Miley; Xiaoshi Zhang; Charles Bevis; Yuka Esashi
With increasingly 3D devices becoming the norm, there is a growing need in the semiconductor industry and in materials science for high spatial resolution, non-destructive metrology techniques capable of determining depth-dependent composition information on devices. We present a solution to this problem using ptychographic coherent diffractive imaging (CDI) implemented using a commercially available, tabletop 13 nm source. We present the design, simulations, and preliminary results from our new complex EUV imaging reflectometer, which uses coherent 13 nm light produced by tabletop high harmonic generation. This tool is capable of determining spatially-resolved composition vs. depth profiles for samples by recording ptychographic images at multiple incidence angles. By harnessing phase measurements, we can locally and nondestructively determine quantities such as device and thin film layer thicknesses, surface roughness, interface quality, and dopant concentration profiles. Using this advanced imaging reflectometer, we can quantitatively characterize materials-sciencerelevant and industry-relevant nanostructures for a wide variety of applications, spanning from defect and overlay metrology to the development and optimization of nano-enhanced thermoelectric or spintronic devices.
Metrology, Inspection, and Process Control for Microlithography XXXII | 2018
Charles Bevis; Robert Karl; Bin Wang; Yuka Esashi; Michael Tanksalvala; Christina L. Porter; Daniel E. Adams; Henry C. Kapteyn; Peter Johnsen; Margaret M. Murnane
We present preliminary through-pellicle imaging using a 30nm tabletop extreme ultraviolet (EUV) coherent diffractive imaging microscope. We show that even in a non-optimized setup, this technique enables through-pellicle imaging of a sample with no detectable impact on image fidelity or resolution.
High-Brightness Sources and Light-driven Interactions | 2018
Robert Karl; Giulia F. Mancini; Dennis F. Gardner; Elisabeth R. Shanblatt; Joshua Knobloch; Travis Frazer; Jorge N. Hernandez-Charpak; Begoña Abad Mayor; Michael Tanksalvala; Christina L. Porter; Daniel E. Adams; Henry C. Kapteyn; Margaret M. Murnane
High-Brightness Sources and Light-driven Interactions | 2018
Christina L. Porter; Michael Tanksalvala; Dennis F. Gardner; Giulia F. Mancini; Michael Gerrity; Galen P. Miley; Xiaoshi Zhang; Naoto Horiguchi; Elisabeth R. Shanblatt; Benjamin R. Galloway; Yuka Esashi; Charles Bevis; Robert Karl; Peter Johnson; Daniel E. Adams; Henry C. Kapteyn; Margaret M. Murnane
International Conference on Ultrafast Phenomena | 2016
Giulia F. Mancini; Dennis F. Gardner; Michael Tanksalvala; Elisabeth R. Shanblatt; Xiaoshi Zhang; Benjamin R. Galloway; Christina L. Porter; Robert Karl; Charles Bevis; Henry C. Kapteyn; Margaret M. Murnane; Daniel E. Adams
Journal of Physics D | 2011
Dawn Vitek; Erica Block; Yves Bellouard; Daniel E. Adams; Sterling Backus; David Kleinfeld; Charles G. Durfee; Jeff Squier
International Conference on Ultrafast Phenomena (2010), paper TuF5 | 2010
Daniel E. Adams; Thomas A. Planchon; Jeff Squier; Charles G. Durfee
Archive | 2009
Adam Goering; Daniel E. Adams; Jeff Squier; Charles G. Durfee