Corentin Monmeyran

On-chip chalcogenide glass waveguide-integrated mid-infrared PbTe detectors

We experimentally demonstrate an on-chip polycrystalline PbTe photoconductive detector integrated with a chalcogenide glass waveguide. The device is monolithically fabricated on silicon, operates at room-temperature, and exhibits a responsivity of 1.0 A/W at wavelengths between 2.1 and 2.5 μm.

Point defect states in Sb-doped germanium

Defect states in n-type Sb-doped germanium were investigated by deep-level transient spectroscopy. Cobalt-60 gamma rays were used to generate isolated vacancies and interstitials which diffuse and react with impurities in the material to form four defect states (E37, E30, E22, and E21) in the upper half of the bandgap. Irradiations at 77 K and 300 K as well as isothermal anneals were performed to characterize the relationships between the four observable defects. E37 is assigned to the Sb donor-vacancy associate (E-center) and is the only vacancy containing defect giving an estimate of 2 × 1011 cm−3 Mrad−1 for the uncorrelated vacancy-interstitial pair introduction rate. The remaining three defect states are interstitial associates and transform among one another. Conversion ratios between E22, E21, and E30 indicate that E22 likely contains two interstitials.

Strategies for increased donor electrical activity in germanium (opto-) electronic materials: a review

ABSTRACT Germanium is one of the strongest candidate materials for next generation integrated optoelectronic devices owing to its high carrier mobilities, bandgap at the telecom wavelength of 1.55 μm, and monolithic (CMOS) integration with silicon. However, for device applications requiring very high carrier concentrations, such as solid state lasers and MOSFETs, a persistent technological hurdle is the limited electrically active concentration ∼5×1019 cm−3 observed in n-type material, regardless of the chemical concentration of incorporated donors above this. This is due to the formation of donor-vacancy clusters, which electrically compensate the material and enhance dopant diffusivity. In recent years, multiple strategies have attempted to address this, with some, albeit limited, success. Here we outline some of the more novel approaches and provide a review with particular emphasis on one of the more promising of these: the co-implantation of donors with fluorine, and discuss potential methods for optimizing this process.

Electrospray Deposition of Uniform Thickness Ge23Sb7S70 and As40S60 Chalcogenide Glass Films.

Solution-based electrospray film deposition, which is compatible with continuous, roll-to-roll processing, is applied to chalcogenide glasses. Two chalcogenide compositions are demonstrated: Ge23Sb7S70 and As40S60, which have both been studied extensively for planar mid-infrared (mid-IR) microphotonic devices. In this approach, uniform thickness films are fabricated through the use of computer numerical controlled (CNC) motion. Chalcogenide glass (ChG) is written over the substrate by a single nozzle along a serpentine path. Films were subjected to a series of heat treatments between 100 °C and 200 °C under vacuum to drive off residual solvent and densify the films. Based on transmission Fourier transform infrared (FTIR) spectroscopy and surface roughness measurements, both compositions were found to be suitable for the fabrication of planar devices operating in the mid-IR region. Residual solvent removal was found to be much quicker for the As40S60 film as compared to Ge23Sb7S70. Based on the advantages of electrospray, direct printing of a gradient refractive index (GRIN) mid-IR transparent coating is envisioned, given the difference in refractive index of the two compositions in this study.

High level active n+ doping of strained germanium through co-implantation and nanosecond pulsed laser melting

Obtaining high level active n+ carrier concentrations in germanium (Ge) has been a significant challenge for further development of Ge devices. By ion implanting phosphorus (P) and fluorine (F) into Ge and restoring crystallinity using Nd:YAG nanosecond pulsed laser melting (PLM), we demonstrate 1020 cm−3 n+ carrier concentration in tensile-strained epitaxial germanium-on-silicon. Scanning electron microscopy shows that after laser treatment, samples implanted with P have an ablated surface, whereas P + F co-implanted samples have good crystallinity and a smooth surface topography. We characterize P and F concentration depth profiles using secondary ion mass spectrometry and spreading resistance profiling. The peak carrier concentration, 1020 cm−3 at 80 nm below the surface, coincides with the peak F concentration, illustrating the key role of F in increasing donor activation. Cross-sectional transmission electron microscopy of the co-implanted sample shows that the Ge epilayer region damaged during impla...

Improved retention of phosphorus donors in germanium using a non-amorphizing fluorine co-implantation technique

Co-doping with fluorine is a potentially promising method for defect passivation to increase the donor electrical activation in highly doped n-type germanium. However, regular high dose donor-fluorine co-implants, followed by conventional thermal treatment of the germanium, typically result in a dramatic loss of the fluorine, as a result of the extremely large diffusivity at elevated temperatures, partly mediated by the solid phase epitaxial regrowth. To circumvent this problem, we propose and experimentally demonstrate two non-amorphizing co-implantation methods; one involving consecutive, low dose fluorine implants, intertwined with rapid thermal annealing and the second, involving heating of the target wafer during implantation. Our study confirms that the fluorine solubility in germanium is defect-mediated and we reveal the extent to which both of these strategies can be effective in retaining large fractions of both the implanted fluorine and, critically, phosphorus donors.

Kerr nonlinearity and multi-photon absorption in germanium at mid-infrared wavelengths

Multiphoton absorption coefficients and nonlinear refractive indices of germanium in the near and mid-infrared (2–5 μm) are reported. The nonlinear coefficients are measured by open and closed aperture Z-scan with 150 fs pulses at a repetition rate of 1 kHz. The nonlinear refractive index of Ge has a peak value of 9.1×10−5cm2/GW at a wavelength of 3 μm. The effect of free electrons generated by multiphoton absorption is discussed by investigating the variation of multiphoton absorption coefficients at different input powers. Kramers-Kronig relations are also discussed with regard to the relationship between nonlinear refractive index and two photon absorption coefficient.

Effect of Gamma Exposure on Chalcogenide Glass Films for Microphotonic Devices

Bulk and thermally evaporated film forms of As2Se3 and Ge23Sb7S70 were subjected to gamma irradiation and characterized periodically after exposure. Differences in the effect of exposure were observed between bulk and film forms.