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Daisuke Hayashi

Tokyo Electron

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Publication

Featured researches published by Daisuke Hayashi.

Archive | 2004

Focus ring and plasma processing apparatus

Akira Koshiishi; Hideaki Tanaka; Nobuyuki Okayama; Masaaki Miyagawa; Shunsuke Mizukami; Wataru Shimizu; Jun Hirose; Toshikatsu Wakaki; Tomonori Miwa; Jun Ooyabu; Daisuke Hayashi

Archive | 2010

GAS FLOW PATH STRUCTURE AND SUBSTRATE PROCESSING APPARATUS

Daisuke Hayashi

Archive | 2005

Thermally sprayed member, electrode and plasma processing apparatus using the electrode

Daisuke Hayashi

Archive | 2007

Attracting disc for an electrostatic chuck for semiconductor production

Daisuke Hayashi

Archive | 2002

Focus ring for semiconductor treatment and plasma treatment device

Takaaki Nezu; Katsumi Horiguchi; Daisuke Hayashi; Toshiya Tsukahara

Archive | 2006

Sealing part and substrate processing apparatus

Daisuke Hayashi; Akira Muramatsu

Archive | 2004

Upper electrode and plasma processing apparatus

Daisuke Hayashi; Toshifumi Ishida; Shigetoshi Kimura

Archive | 2004

Surface treating device and surface treating method

Kazuya Nagaseki; Tadashi Onishi; Koichi Murakami; Daisuke Hayashi; Akiko Kamigori; Minoru Honda

Archive | 2004

Partial pressure control system, flow rate control system and shower plate used for partial pressure control system

Hideki Nagaoka; Hiroshi Koizumi; Jun Ooyabu; Tsuyoshi Shimazu; Hiroki Endo; Keiki Ito; Daisuke Hayashi

Archive | 2007

ELECTRODE FOR GENERATING PLASMA AND PLASMA PROCESSING APPARATUS USING SAME

Daisuke Hayashi

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Collaboration

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Kazuya Nagaseki

Tokyo Electron

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Shinji Himori

Tokyo Electron

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Ryo Nonaka

Tokyo Electron

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Koichi Murakami

Tokyo Electron

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Atsushi Matsuura

Tokyo Electron

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Jun Ooyabu

Tokyo Electron

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Nobuyuki Okayama

Tokyo Electron

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Shigetoshi Kimura

Tokyo Electron

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Toshifumi Ishida

Tokyo Electron

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Toshiya Tsukahara

Tokyo Electron

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