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Dive into the research topics where Daisuke Kori is active.

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Featured researches published by Daisuke Kori.


Archive | 2011

Resist underlayer film composition and patterning process using the same

Tsutomu Ogihara; Daisuke Kori; Yusuke Biyajima; Takeru Watanabe; Toshihiko Fujii; Takeshi Kinsho


Archive | 2014

NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS

Takeshi Kinsho; Daisuke Kori; Katsuya Takemura; Takeru Watanabe; Tsutomu Ogihara


Archive | 2012

Biphenyl derivative, resist bottom layer material, bottom layer forming method, and patterning process

Daisuke Kori; Takeshi Kinsho; Katsuya Takemura; Tsutomu Ogihara; Takeru Watanabe; Hiroyuki Urano


Archive | 2012

Resist underlayer film composition, method for producing polymer for resist underlayer film, and patterning process using the resist underlayer film composition

Seiichiro Tachibana; Daisuke Kori; Tsutomu Ogihara; Kazumi Noda; Takeshi Kinsho


Archive | 2013

COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USING THE SAME, PROCESS FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS

Seiichiro Tachibana; Daisuke Kori; Tsutomu Ogihara; Takeru Watanabe; Kazumi Noda; Toshiharu Yano


Archive | 2010

RESIST UNDERLAYER FILM-FORMING COMPOSITION, PROCESS FOR FORMING RESIST UNDERLAYER FILM AND PATTERNING PROCESS

Tsutomu Ogihara; Takeru Watanabe; Takeshi Kinsho; Katsuya Takemura; Toshihiko Fujii; Daisuke Kori


Archive | 2014

Underlayer film-forming composition and pattern forming process

Jun Hatakeyama; Daisuke Kori; Tsutomu Ogihara


Archive | 2011

NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, RESIST BOTTOM LAYER FORMING METHOD, AND PATTERNING PROCESS

Takeshi Kinsho; Katsuya Takemura; Daisuke Kori; Takeru Watanabe; Tsutomu Ogihara


Archive | 2011

RESIST UNDERLAYER FILM COMPOSITION, PROCESS FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS AND FULLERENE DERIVATIVE

Takeru Watanabe; Takeshi Kinsho; Tsutomu Ogihara; Katsuya Takemura; Toshihiko Fujii; Daisuke Kori


Archive | 2014

METHOD FOR CLEANING AND DRYING SEMICONDUCTOR SUBSTRATE

Tsutomu Ogihara; Takeshi Nagata; Jun Hatakeyama; Daisuke Kori

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