Daisuke Shiraishi
Hitachi
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Publication
Featured researches published by Daisuke Shiraishi.
IEEE Transactions on Semiconductor Manufacturing | 2015
Takeshi Ohmori; Makoto Kashibe; Satoshi Une; Koichi Yamamoto; Daisuke Shiraishi; Satomi Inoue
The correlation between the change in the etching rate of SiN and the change in the monitored plasma impedance was investigated to estimate the capability of critical dimension (CD) prediction with a plasma impedance monitor (PIM). The results obtained with the PIM were compared with those of optical emission spectroscopy (OES), which was performed using the emission intensity ratio of C2/H, and showed that the SiN etching rate is strongly correlated with several values obtained with the PIM. We conclude that the PIM has the potential to predict CDs with the same accuracy as that of OES.
Archive | 2004
Junichi Tanaka; Hiroyuki Kitsunai; Akira Kagoshima; Daisuke Shiraishi; Hideyuki Yamamoto; Shoji Ikuhara; Toshio Masuda
Archive | 2002
Akira Kagoshima; Motohiko Yoshigai; Hideyuki Yamamoto; Daisuke Shiraishi; Junichi Tanaka; Kenji Tamaki; Natsuyo Morioka
Archive | 2009
Toshihiro Morisawa; Daisuke Shiraishi; Satomi Inoue
Archive | 2000
Hiromitsu Enami; Akira Kagoshima; Shigeru Masuda; Natsuyo Morioka; Daisuke Shiraishi; 茂 増田; なつよ 森岡; 弘充 榎並; 大輔 白石; 昭 鹿子嶋
Archive | 2006
Shoji Ikuhara; Hideyuki Yamamoto; Daisuke Shiraishi; Akira Kagoshima
Archive | 2003
Junichi Tanaka; Hiroyuki Kitsunai; Akira Kagoshima; Daisuke Shiraishi; Hideyuki Yamamoto; Shoji Ikuhara; Toshio Masuda
Archive | 2003
Junichi Tanaka; Hiroyuki Kitsunai; Hideyuki Yamamoto; Akira Kagoshima; Daisuke Shiraishi
Archive | 2009
Toshihiro Morisawa; Shoji Ikuhara; Akira Kagoshima; Daisuke Shiraishi
Archive | 2009
Hiroshige Uchida; Daisuke Shiraishi; Shoji Ikuhara; Akira Kagoshima
