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Dive into the research topics where Daniel A. Rothweil is active.

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Featured researches published by Daniel A. Rothweil.


Archive | 1999

Reliable modular production quality narrow-band high REP rate excimer laser

David W. Myers; Herve A. Besaucele; Palash P. Das; Thomas P. Duffey; Alexander I. Ershov; Igor V. Fomenkov; Thomas Hofmann; Richard G. Morton; Richard M. Ness; Peter C. Newman; Robert G. Ozarski; Gamaralalage G. Padmabandu; William N. Partlo; Daniel A. Rothweil; Richard L. Sandstrom; Paul S. Thompson; Richard C. Ujazdowski; Tom A. Watson; R. Kyle Webb; Paolo Zambon


Archive | 1998

RELIABLE, MODULAR, PRODUCTION QUALITY NARROW-BAND KrF EXCIMER LASER

David S. Knowles; James H. Azzola; Herve A. Besaucele; Palash P. Das; Alexander I. Ershov; Igor V. Fomenkov; Tibor Juhasz; Robert G. Ozarski; William N. Partlo; Daniel A. Rothweil; Richard L. Sandstrom; Richard C. Ujazdowski; Tom A. Watson; Richard M. Ness


Archive | 1998

High pulse rate pulse power system

William N. Partlo; Daniel L. Birx; Richard M. Ness; Daniel A. Rothweil; Paul C. Melcher; Brett D. Smith


Archive | 2000

High pulse rate pulse power system with fast rise time and low leakage current

Daniel L. Birx; William N. Partlo; Richard M. Ness; Daniel A. Rothweil; Paul C. Melcher; Brett D. Smith


Archive | 1999

High pulse rate pulse power system with fast rise time and low current

William N. Partlo; Daniel L. Birx; Richard M. Ness; Daniel A. Rothweil; Paul C. Melcher; Brett D. Smith


Archive | 1998

High pulse rate pulse power system with resonant power supply

William N. Partlo; Daniel L. Birx; Richard M. Ness; Daniel A. Rothweil; Paul C. Melcher; Brett D. Smith


Archive | 1997

Excimer laser having power supply with fine digital regulation

Daniel A. Rothweil; Igor V. Fomenkov


Archive | 2000

High pulse rate pulse power system with liquid cooling

William N. Partlo; Daniel L. Birx; Richard M. Ness; Daniel A. Rothweil; Paul C. Melcher; Brett D. Smith


Archive | 1999

HIGH-RELIABILITY MODULAR PRODUCTION HIGH-QUALITY NARROW- BAND HIGH-REPETITION RATE ArF EXCIMER LASER

Herve A. Besaucele; Toshihiko Ishihara; T Melchior John; Richard G. Morton; Richard M. Ness; Peter C. Newman; William N. Partlo; Daniel A. Rothweil; Richard L. Sandstrom; P Daffy Thomas; エヌ パートロ ウィリアム; ティー メルチオー ジョン; エイ ロスウェイル ダニエル; ピー ダフィー トーマス; エイ ベゾーセル ハーヴィ; シー ニューマン ピーター; エム ネス リチャード; エル サンドストローム リチャード; ジー モートン リチャード; 俊彦 石原


Archive | 2007

Gas discharge laser system

Thomas Hofmann; Jean-Marc Hueber; Palach P. Das; Toshihiko Ishihara; Thomas P. Duffey; John T. Melchior; Herve A. Besaucele; Richard G. Morton; Richard M. Ness; Peter C. Newman; William N. Partlo; Daniel A. Rothweil; Richard L. Sandstrom

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