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Dietmar Neugebauer

Carl Zeiss AG

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Publication

Featured researches published by Dietmar Neugebauer.

Archive | 2012

METHOD OF MEASURING A SHAPE OF AN OPTICAL SURFACE AND INTERFEROMETRIC MEASURING DEVICE

Rolf Freimann; Bernd Boerband; Stefan Schulte; Albrecht Hof; Frank Riepenhausen; Matthias Manger; Dietmar Neugebauer; Helmut Ißler; Armin Bich

Archive | 2012

OPTICAL SYSTEM, IN PARTICULAR IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

Albrecht Hof; Dietmar Neugebauer; Rolf Freimann

Archive | 2003

Positioning device for positioning a positioning arrangement, e.g. for use in semiconductor microlithography, has a two-component measurement system for measuring movement differences and within an inertial reference system

Albrecht Hof; Dietmar Neugebauer

Archive | 2012

Method of measuring a shape of an optical surface based on computationally combined surface region measurements and interferometric measuring device

Rolf Freimann; Bernd Doerband; Stefan Schulte; Albrecht Hof; Frank Riepenhausen; Matthias Manger; Dietmar Neugebauer; Helmut Ißler; Armin Bich

Archive | 2011

Optical system for use in microlithography projection illumination system for microlithography for production of e.g. LCD, has two optical components, where length measurement sections directly run between optical components

Albrecht Hof; Dietmar Neugebauer; Rolf Freimann

Archive | 2011

Optical system in microlithographic projection exposure apparatus, has measurement arrangement, which determines relative position of first and second optical component in six different length measurement sections

Albrecht Hof; Dietmar Neugebauer; Rolf Freimann

Archive | 2007

Device and method for measuring lithography masks

Albrecht Hof; Günter Maul; Dietmar Neugebauer; Armin Bich; Monika Frey; Wolfgang Scherm; Stefan Otto; Rainer Maul; Helmut Krause

Archive | 2005

Optical unit e.g. lens, processing device, has ion beam source in vacuum chamber, and pivoting arrangement pivoted around pivoting axis with source, where arrangement and source are adjusted relative to each other in shifting directions

Armin Bich; Albrecht Hof; Dietmar Neugebauer

Archive | 2008

Component e.g. optical element, storage system for microlithography projection exposure system, has decoupling element atmospherically separated from another element by partition, and sealing element provided between rod and partition

Dietmar Neugebauer; Stefan Otto

Archive | 2009

METHOD OF MEASURING A SHAPE OF AN OPTICAL SURFACE

Rolf Freimann; Bernd Dörband; Stefan Schulte; Albrecht Hof; Frank Riepenhausen; Matthias Manger; Dietmar Neugebauer; Helmut Issler; Armin Bich

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Albrecht Hof

Carl Zeiss AG

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Rolf Freimann

Carl Zeiss AG

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Armin Bich

Carl Zeiss AG

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Frank Riepenhausen

Carl Zeiss AG

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Matthias Manger

Carl Zeiss AG

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Stefan Otto

Carl Zeiss AG

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Stefan Schulte

Carl Zeiss AG

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Helmut Ißler

Carl Zeiss AG

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Bernd Boerband

Carl Zeiss AG

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Bernd Doerband

Carl Zeiss AG

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