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Dive into the research topics where Dmitrii V. Sidelev is active.

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Featured researches published by Dmitrii V. Sidelev.


Journal of Physics: Conference Series | 2016

Antifriction coatings based on a-C for biomedicine applications

Yuriy N. Yurjev; D V Kiseleva; D A Zaitcev; Dmitrii V. Sidelev; O S Korneva

This article reports on the investigation of mechanical properties of carbon films deposited by dual magnetron sputtering system with closed and mirror magnetic field. There is shown that a-C films with predominantly sp2-phase have relatively high hardness (up to 20 GPa) and low friction index (~0.01). The influence of magnetic field on friction index is determined. The analysis of experimental data shows the obtained a-C samples can be used for biomedicine applications.


Journal of Physics: Conference Series | 2016

Aluminum films deposition by magnetron sputtering systems: Influence of target state and pulsing unit

Dmitrii V. Sidelev; A V Yuryeva; V.P. Krivobokov; A S Shabunin; M S Syrtanov; Z Koishybayeva

This article reports on technological possibilities of magnetron sputtering systems with solid-state and liquid-phase targets to deposition of aluminum films and its structure. The comparison of deposition rates of magnetron sputtering systems with direct current (DC), midfrequency (MF) and high power pulsed (HiPIMS) supplies is shown. The optical emission spectroscopy indicates a high component of target material ions in discharge gap only to HiPIMS technique. Al films are a (111)-line oriented in DC and MF power supply cases, for high power pulsed unit - aluminum films also have intense (220)-line. The dependence of grain sizes and sputtering technique parameters is obtained.


Acta Polytechnica | 2016

MAGNETRON SPUTTERING WITH HOT SOLID TARGET: THERMAL PROCESSES AND EROSION

Alena Olegovna Borduleva; Galina Alekseevna Bleykher; Dmitrii V. Sidelev; Valeriy P. Krivobokov

This work focuses on erosion and thermal processes taking place on the surface of the titanium target in magnetron sputtering. The study was carried out using magnetron sputtering systems (MSS) with different thermal insulation target types from the magnetron body. It was found that the presence of an evaporation component allows the rate of removal of atoms from the surface of a solid target to be increased with limited thermal conduction. A mathematical simulation was used to evaluate the contribution of evaporation to the increase in the coating deposition rate for complete and partial thermal insulation. It was found that non-uniformity of the direct-axis component of the magnetic induction vector helps to localize the heating. also increases the evaporation rate on the surface of the target. It was proved that local evaporation including sublimations on the surface of a hot target is a significant factor in increasing the coating deposition rate. Due to this mechanism, the coating deposition rate can be increased 5 times for Ti in comparison with fully cooled targets. This result can be applied for direct current magnetrons and also for pulsed systems. It was also found that evaporation increased the energy efficiency of the target erosion. The most suitable metals were selected for obtaining high-intensity emission of atoms from a solid target.


Vacuum | 2016

Evaporation factor in productivity increase of hot target magnetron sputtering systems

Galina A. Bleykher; Alena Olegovna Borduleva; V.P. Krivobokov; Dmitrii V. Sidelev


Surface & Coatings Technology | 2016

High-rate magnetron sputtering with hot target

Dmitrii V. Sidelev; Galina A. Bleykher; Valeriy P. Krivobokov; Zhanumgyl Koishybayeva


Vacuum | 2017

A comparative study on the properties of chromium coatings deposited by magnetron sputtering with hot and cooled target

Dmitrii V. Sidelev; Galina A. Bleykher; Massimiliano Bestetti; V.P. Krivobokov; Antonello Vicenzo; Silvia Franz; Maria Francesca Brunella


Vacuum | 2016

The oxygen-deficient TiO2 films deposited by a dual magnetron sputtering

Dmitrii V. Sidelev; Yury N. Yurjev; Valeriy P. Krivobokov; Evgenii V. Erofeev; Olga V. Penkova; Vadim A. Novikov


Vacuum | 2018

The role of thermal processes and target evaporation in formation of self-sputtering mode for copper magnetron sputtering

Galina A. Bleykher; Alena Yuryeva; A.S. Shabunin; V.P. Krivobokov; Dmitrii V. Sidelev


Surface & Coatings Technology | 2018

Hot target magnetron sputtering for ferromagnetic films deposition

Dmitrii V. Sidelev; Galina A. Bleykher; Vladislav A. Grudinin; V.P. Krivobokov; Massimiliano Bestetti; Maxim Syrtanov; Evgenii V. Erofeev


Advanced Materials Research | 2014

Effect of Magnetic Field Configuration of Dual Magnetron on Carbon Based Films Properties

Yuriy N. Yurjev; Danil A. Zaitcev; Dmitrii V. Sidelev; Olga Sergeevna Tupikova

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Galina A. Bleykher

Tomsk Polytechnic University

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V.P. Krivobokov

Tomsk Polytechnic University

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Yuriy N. Yurjev

Tomsk Polytechnic University

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Evgenii V. Erofeev

Tomsk State University of Control Systems and Radio-electronics

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A S Shabunin

Tomsk Polytechnic University

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A V Yuryeva

Tomsk Polytechnic University

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Alena Yuryeva

Tomsk Polytechnic University

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