V.P. Krivobokov

Magnetron deposition of coatings with evaporation of the target

We analyze the potentialities of the plasma in various types of magnetron sputtering systems including pulsed and liquid-target systems for producing intense emission of atoms and high-rate deposition of coatings. For this purpose, a mathematical model of thermal and erosion processes in the target is developed based on the heat conduction equations taking into account first-order phase transitions. Using this model, we determine the parameters of magnetrons for which intense evaporation of atoms from the target surface takes place. It is shown that evaporation leads to an increase in the growth rate of metal coatings by 1–2 orders of magnitude as compared to conventional magnetron systems based only on collisional sputtering.

Sputtering of the magnetron diode target in the presence of an external ion beam

The effect of an external ion beam on the plasma and target of a dc magnetron sputtering system in the course of reactive deposition of films is investigated. A combined experimental setup consisting of a magnetron diode and a hall-current ion source is constructed. The influence of a fast ion beam on the discharge current formation, the target emission characteristics, and the target etching rate is considered. It is shown that the ion assistance expands the operating range of the magnetron diode, increases the deposition rate, and substantially shortens the target training time. At the same time, it practically does not affect the ionization processes in the plasma.

Aluminum films deposition by magnetron sputtering systems: Influence of target state and pulsing unit

This article reports on technological possibilities of magnetron sputtering systems with solid-state and liquid-phase targets to deposition of aluminum films and its structure. The comparison of deposition rates of magnetron sputtering systems with direct current (DC), midfrequency (MF) and high power pulsed (HiPIMS) supplies is shown. The optical emission spectroscopy indicates a high component of target material ions in discharge gap only to HiPIMS technique. Al films are a (111)-line oriented in DC and MF power supply cases, for high power pulsed unit - aluminum films also have intense (220)-line. The dependence of grain sizes and sputtering technique parameters is obtained.

Application of strongly focused pulsed electron beam for the reaction wheels balancing

In the given work the material removing possibility by the strongly focused pulsed electron beam was investigated. The optimal mode of flywheels balancing was found. At this mode the power density is 1.6 MW/cm2 and pulse duration is 0.65 s. At such parameters the evaporation rate is equal to 11 g/scm2. It is possible to vary the amount of remote material from 1 to 100 mg, that is sufficient to balance flywheel. It is found that treatment by an electron beam does not change the material structure.

Solid surface erosion under irradiation of powerful pulsed electron beams

The metal surface erosion properties under the action of electron beams of nano- and microsecond duration with particle energy of 10..1000 keV and power density of 106..1010 W/cm2 are investigated. The dependences of intensity and energy efficiency of substance removal from the surface on the beam parameters are obtained by numerical modeling. It is shown that such beams are able to remove effectively the substance from the irradiated surface.

Model of the Anode Layer of a Magnetron Discharge

The anode layer of the magnetron discharge plasma is considered within the framework of a hydrodynamic approximation with the electron mobility and collision frequency assumed to be constant. A rigorous solution of the system of equations has been obtained. The solutions of this problem known so far have been shown to be particular cases of the one found in this work. The range of applicability of the anode layer model to the calculation of the main parameters of dc magnetron sputtering systems is discussed.