Galina A. Bleykher

Magnetron deposition of coatings with evaporation of the target

We analyze the potentialities of the plasma in various types of magnetron sputtering systems including pulsed and liquid-target systems for producing intense emission of atoms and high-rate deposition of coatings. For this purpose, a mathematical model of thermal and erosion processes in the target is developed based on the heat conduction equations taking into account first-order phase transitions. Using this model, we determine the parameters of magnetrons for which intense evaporation of atoms from the target surface takes place. It is shown that evaporation leads to an increase in the growth rate of metal coatings by 1–2 orders of magnitude as compared to conventional magnetron systems based only on collisional sputtering.

Application of strongly focused pulsed electron beam for the reaction wheels balancing

In the given work the material removing possibility by the strongly focused pulsed electron beam was investigated. The optimal mode of flywheels balancing was found. At this mode the power density is 1.6 MW/cm2 and pulse duration is 0.65 s. At such parameters the evaporation rate is equal to 11 g/scm2. It is possible to vary the amount of remote material from 1 to 100 mg, that is sufficient to balance flywheel. It is found that treatment by an electron beam does not change the material structure.

Solid surface erosion under irradiation of powerful pulsed electron beams

The metal surface erosion properties under the action of electron beams of nano- and microsecond duration with particle energy of 10..1000 keV and power density of 106..1010 W/cm2 are investigated. The dependences of intensity and energy efficiency of substance removal from the surface on the beam parameters are obtained by numerical modeling. It is shown that such beams are able to remove effectively the substance from the irradiated surface.