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Douglas P. Nadeau

IBM

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Publication

Featured researches published by Douglas P. Nadeau.

Archive | 1996

Process for removing residue from a semiconductor wafer after chemical-mechanical polishing

Cuc K. Huynh; Matthew J. Rutten; Susan L. Cohen; Douglas P. Nadeau; Robert A. Jurjevic; James Albert Gilhooly

Archive | 1997

CMP polishing pad backside modifications for advantageous polishing results

Roger W. Cheek; John Edward Cronin; Douglas P. Nadeau; Matthew J. Rutten; Terrance M. Wright

Archive | 1996

Silicon wafer cleaning and polishing pads

Michael R. Amsden; Richard A. Bartley; Cuc K. Huynh; Paul A. Manfredi; Douglas P. Nadeau

Archive | 1999

In-situ automated CMP wedge conditioner

Kent R. Becker; Scott R. Cline; Paul A. Manfredi; Douglas P. Nadeau

Archive | 2002

Off-concentric polishing system design

Cuc K. Huynh; Paul A. Manfredi; Thomas Martin; Douglas P. Nadeau; Yutong Wu

Archive | 2001

Wafer carrier rinsing mechanism

Cuc K. Huynh; Paul A. Manfredi; Thomas Martin; Douglas P. Nadeau; Joseph M. Weatherwax

Archive | 1998

Downstream monitor for CMP brush cleaners

Donald M. DeCain; Cuc K. Huynh; Robert A. Jurjevic; Douglas P. Nadeau; Marc A. Taubenblatt

Archive | 1997

Brush conditioner wing

Paul A. Manfredi; Douglas P. Nadeau; Raymond G. Morris; Richard A. Bartley; Michael R. Amsden

Archive | 2000

Brush pressure control system for chemical and mechanical treatment of semiconductor surfaces

Paul A. Manfredi; Douglas P. Nadeau

Archive | 2000

Method for chemical mechanical polishing of semiconductor wafer

Cuc K. Huynh; Paul A. Manfredi; Thomas Martin; Douglas P. Nadeau

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Paul A. Manfredi

IBM

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Cuc K. Huynh

IBM

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Thomas Martin

IBM

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Matthew J. Rutten

IBM

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Michael R. Amsden

IBM

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Richard A. Bartley

IBM

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Robert A. Jurjevic

IBM

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Scott R. Cline

IBM

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Charles A. McKinney

IBM

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Charles B. Winn

IBM

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