Edmund J. Stark

A novel positive-tone and aqueous-base-developable photosensitive benzocyclobutene-based material for microelectronics

This work describes a positive-tone and aqueous-base-developable benzocyclobutene (BCB)-based dielectric material. The polymer is made from divinylsiloxane bis(benzocyclobutene) and BCB-acrylic acid. A diazonap-thoquinone in the formulation makes it photosensitive. Patterned films have high resolution, and via openings are scum-free without a de-scum operation. The material possesses optical, electrical, thermal, and mechanical properties desirable for many microelectronic applications, including as a planarization layer or an insulation layer in display, and in packaging.

Aqueous-Base-Developable Benzocyclobutene (BCB)-Based Material Curable in Air

A positive-tone and aqueous-base-developable benzocyclobutene (BCB)-based dielectric material curable in air is described in this paper. The prepolymer is made from divinylsiloxane bisbenzocyclobutene (DVS-bisBCB) and BCB-acrylic acid. The formulation contains antioxidants that allow the prepolymer to cure in air and a diazonaphthaquinone to make it photosensitive. Patterned films have high resolution, and via openings are scum-free without a descum operation. Whether cured in nitrogen or in air, the prepolymer produces a film with optical, electrical, thermal, and mechanical properties desirable for many microelectronic applications, such as packaging applications and as a planarization or insulation layer in display applications

P-59: Aqueous-Base-Developable Benzocyclobutene (BCB)-Based Material for Display Applications

A self-priming and photosensitive aqueous-base-developable benzocyclobutene (BCB)-based dielectric material curable in air is described. Patterned films have high resolution. Whether cured in nitrogen or in air, the formulation produces a film with optical, electrical, thermal, and mechanical properties desirable for many microelectronic applications, such as a planarization layer or insulation layer in display applications.

The Thermal Decomposition of Styrene-co-acrylonitrile Trimers to Form 2-Amino-3-methyl-1-naphthalenecarbonitrile

Abstract During the spontaneous copolymerization of styrene and acrylonitrile, many different trimer structures are formed. Some of the trimers contain two acrylonitrile units and one styrene unit (An2S). These trimers are composed of three pairs of cis-trans diastereomers, all having a 1-substituted-4-cyanotetralin nucleus. Two of the cis-trans pairs have been found to decompose upon heating resulting in the formation of 2-amino-3-methyl-1-naphthalenecarbonitrile. The mechanism of this rearrangement involves the elimination of ethylene via a retro Diels-Alder reaction. Kinetic investigations show that the reaction is first order in An2S trimer.