Eiji Morinaga
Asahi Glass Co.
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Publication
Featured researches published by Eiji Morinaga.
International Congress on Applications of Lasers & Electro-Optics | 2005
Reo Usui; Ryohei Satoh; Yoshiharu Iwata; Koji Nakagawa; Eiji Morinaga; Satoru Takaki
On a microcircuit pattern, which is necessary for fabricating electrical devices such as plasma display and liquid crystal display, the wet process which utilizes lithography technology is commonly employed. The wet process, however, is not desirable because it needs a large number of process steps. Furthermore, chemical used in the process is hazardous to the environment. Therefore, a “dry process” that does not utilize the lithography is strongly desired. In this paper, to realize the dry process, a laser processing approach using a Nd:YAG laser is adopted as an alternative technology. We fabricate thin films made of SnO2 (a next generation material for transparent thin film electrodes for Flat-Panel Display (FPD)) under various conditions and examine the effectiveness of the laser processing approach via experiments with the thin films. We found that the film characteristics such as electrical resisivity, crystalline structure quality, and so on, change and that the effectiveness of the laser processing varies, depending on the conditions. In this work, we show that these results can be explained in terms of a wavelength shift in the absorption edge of the thin films for Nd:YAG laser from the viewpoint of interaction of light and electrons.On a microcircuit pattern, which is necessary for fabricating electrical devices such as plasma display and liquid crystal display, the wet process which utilizes lithography technology is commonly employed. The wet process, however, is not desirable because it needs a large number of process steps. Furthermore, chemical used in the process is hazardous to the environment. Therefore, a “dry process” that does not utilize the lithography is strongly desired. In this paper, to realize the dry process, a laser processing approach using a Nd:YAG laser is adopted as an alternative technology. We fabricate thin films made of SnO2 (a next generation material for transparent thin film electrodes for Flat-Panel Display (FPD)) under various conditions and examine the effectiveness of the laser processing approach via experiments with the thin films. We found that the film characteristics such as electrical resisivity, crystalline structure quality, and so on, change and that the effectiveness of the laser processin...
Archive | 2009
Ryohei Satoh; Koji Nakagawa; Eiji Morinaga; Reo Usui; Kenji Tanaka; Satoru Takaki; Kenichi Ebata; Hiroshi Sakamoto
Archive | 2012
Azumi Nomura; 安曇 野村; Masao Yamamura; 正男 山村; Daiji Iwanaga; 大司 岩永; Etsuo Fujita; 悦夫 藤田; Eiji Morinaga; 英二 森永
Archive | 2008
Ryohei Satoh; Koji Nakagawa; Eiji Morinaga; Reo Usui; Takamitsu Isono; Kenji Tanaka; Satoru Takaki; Kenichi Ebata; Hiroshi Sakamoto
Journal of Smart Processing | 2014
Hidenori Murata; Yoshiharu Iwata; Ryohei Satoh; Eiji Morinaga; Kazuya Okamoto; Kazuhiro Aoyama; Tsuyoshi Koga
Sid Symposium Digest of Technical Papers | 2007
Ryohei Satoh; Reo Usui; Eiji Morinaga; Yoshiharu Iwata
The Proceedings of Design & Systems Conference | 2012
Hidenori Murata; Yoshiharu Iwata; Ryohei Satoh; Eiji Morinaga
The Proceedings of Design & Systems Conference | 2012
Hidenori Murata; Yoshiharu Iwata; Ryohei Satoh; Eiji Morinaga; Kazuhiro Aoyama; Tsuyoshi Koga
The Proceedings of Design & Systems Conference | 2009
Atsushi Taya; Yoshiharu Iwata; Ryohei Satoh; Eiji Morinaga; Hidenori Murata; Kazuya Okamoto; Keiji Kudo
Archive | 2009
Ryohei Satoh; Koji Nakagawa; Eiji Morinaga; Reo Usui; Kenji Tanaka; Satoru Takaki; Kenichi Ebata; Hiroshi Sakamoto