Elina Färm

X-ray ptychographic computed tomography at 16 nm isotropic 3D resolution

X-ray ptychography is a scanning variant of coherent diffractive imaging with the ability to image large fields of view at high resolution. It further allows imaging of non-isolated specimens and can produce quantitative mapping of the electron density distribution in 3D when combined with computed tomography. The method does not require imaging lenses, which makes it dose efficient and suitable to multi-keV X-rays, where efficient photon counting, pixelated detectors are available. Here we present the first highly resolved quantitative X-ray ptychographic tomography of an extended object yielding 16 nm isotropic 3D resolution recorded at 2 Å wavelength. This first-of-its-kind demonstration paves the way for ptychographic X-ray tomography to become a promising method for X-ray imaging of representative sample volumes at unmatched resolution, opening tremendous potential for characterizing samples in materials science and biology by filling the resolution gap between electron microscopy and other X-ray imaging techniques.

Ultra-high resolution zone-doubled diffractive X-ray optics for the multi-keV regime

X-ray microscopy based on Fresnel zone plates is a powerful technique for sub-100 nm resolution imaging of biological and inorganic materials. Here, we report on the modeling, fabrication and characterization of zone-doubled Fresnel zone plates for the multi-keV regime (4-12 keV). We demonstrate unprecedented spatial resolution by resolving 15 nm lines and spaces in scanning transmission X-ray microscopy, and focusing diffraction efficiencies of 7.5% at 6.2 keV photon energy. These developments represent a significant step towards 10 nm spatial resolution for hard X-ray energies of up to 12 keV.

Nanofocusing of hard X-ray free electron laser pulses using diamond based Fresnel zone plates

A growing number of X-ray sources based on the free-electron laser (XFEL) principle are presently under construction or have recently started operation. The intense, ultrashort pulses of these sources will enable new insights in many different fields of science. A key problem is to provide x-ray optical elements capable of collecting the largest possible fraction of the radiation and to focus into the smallest possible focus. As a key step towards this goal, we demonstrate here the first nanofocusing of hard XFEL pulses. We developed diamond based Fresnel zone plates capable of withstanding the full beam of the worlds most powerful x-ray laser. Using an imprint technique, we measured the focal spot size, which was limited to 320 nm FWHM by the spectral band width of the source. A peak power density in the focal spot of 4×1017 W/cm2 was obtained at 70 fs pulse length.

Selective-Area Atomic Layer Deposition Using Poly(vinyl pyrrolidone) as a Passivation Layer

Selective-area atomic layer deposition (ALD) was studied using poly(vinyl pyrrolidone) (PVP) films as growth-preventing mask layers. The PVP films were prepared by spin coating and patterned by UV lithography. The PVP films were tested in several ALD processes: iridium, platinum, ruthenium, Al 2 O 3 , and ZrO 2 . The deposition temperatures were 250-300°C. In general, the PVP film passivated the surface against the noble metal processes, but the oxide films grew on PVP. However, the oxide films did not grow through the PVP film on the substrate surface and, therefore, the films could still be patterned, though with more of a lift-off method rather than with pure selective-area ALD.

Dense high aspect ratio hydrogen silsesquioxane nanostructures by 100 keV electron beam lithography.

We investigated the fabrication of dense, high aspect ratio hydrogen silsesquioxane (HSQ) nanostructures by 100 keV electron beam lithography. The samples were developed using a high contrast developer and supercritically dried in carbon dioxide. Dense gratings with line widths down to 25 nm were patterned in 500 nm-thick resist layers and semi-dense gratings with line widths down to 10 nm (40 nm pitch) were patterned in 250 nm-thick resist layers. The dense HSQ nanostructures were used as molds for gold electrodeposition, and the semi-dense HSQ gratings were iridium-coated by atomic layer deposition. We used these methods to produce Fresnel zone plates with extreme aspect ratio for scanning transmission x-ray microscopy that showed excellent performance at 1.0 keV photon energy.

Programming nanostructured soft biological surfaces by atomic layer deposition

Here, we present the first successful attempt to programme the surface properties of nanostructured soft biological tissues by atomic layer deposition (ALD). The nanopatterned surface of lotus leaf was tuned by 3-125 nm TiO2 thin films. The lotus/TiO2 composites were studied by SEM-EDX, XPS, Raman, TG-DTA, XRR, water contact angle and photocatalysis measurements. While we could preserve the superhydrophobic feature of lotus, we managed to add a new property, i.e. photocatalytic activity. We also explored how surface passivation treatments and various ALD precursors affect the stability of the sensitive soft biological tissues. As we were able to gradually change the number of nanopatterns of lotus, we gained new insight into how the hollow organic nanotubes on the surface of lotus influence its superhydrophobic feature.

Passivation of copper surfaces for selective-area ALD using a thiol self-assembled monolayer

Self-assembled monolayers (SAMs) of 1-dodecanethiol (CH3(CH2)11SH) were prepared from the vapor phase and used as a passivation layer for selective-area ALD. Thiol SAMs have commonly been prepared by immersing the substrates into a solution containing alkyl thiols. Formation of SAMs from the vapor phase, however, has advantages compared to liquid phase preparation. Passivation of surface can be done as a part of the ALD process forming a SAM first and then continuing with the common ALD process. SAMs can also be applied to three-dimensional structures relying on chemical selectivity of the thiol SAM formation. For example in the copper damascene process the thiol SAMs should form only on the copper surface but not on the insulators. In this study, the SAMs were prepared by placing the substrate and the alkylthiol to the reaction chamber and heating the system to the temperature of 73 ?C. Preparation time varied from 0.5 to 24 h. Passivation properties of SAMs were tested with ALD iridium and polyimide processes. Iridium was deposited at 250? ? C for 500 cycles and polyimide at 160? ? C for 20 cycles.

Following the dynamics of matter with femtosecond precision using the X-ray streaking method

X-ray Free Electron Lasers (FELs) can produce extremely intense and very short pulses, down to below 10 femtoseconds (fs). Among the key applications are ultrafast time-resolved studies of dynamics of matter by observing responses to fast excitation pulses in a pump-probe manner. Detectors with sufficient time resolution for observing these processes are not available. Therefore, such experiments typically measure a samples full dynamics by repeating multiple pump-probe cycles at different delay times. This conventional method assumes that the sample returns to an identical or very similar state after each cycle. Here we describe a novel approach that can provide a time trace of responses following a single excitation pulse, jitter-free, with fs timing precision. We demonstrate, in an X-ray diffraction experiment, how it can be applied to the investigation of ultrafast irreversible processes.

High resolution double-sided diffractive optics for hard X-ray microscopy

The fabrication of high aspect ratio metallic nanostructures is crucial for the production of efficient diffractive X-ray optics in the hard X-ray range. We present a novel method to increase their structure height via the double-sided patterning of the support membrane. In transmission, the two Fresnel zone plates on the two sides of the substrate will act as a single zone plate with added structure height. The presented double-sided zone plates with 30 nm smallest zone width offer up to 9.9% focusing efficiency at 9 keV, that results in a factor of two improvement over their previously demonstrated single-sided counterparts. The increase in efficiency paves the way to speed up X-ray microscopy measurements and allows the more efficient utilization of the flux in full-field X-ray microscopy.

High Aspect-Ratio Iridium-Coated Nanopillars for Highly Reproducible Surface-Enhanced Raman Scattering (SERS).

A variety of different gold and silver nanostructures have been proposed over the years as high sensitivity surface-enhanced Raman scattering (SERS) sensors. However, efficient use of SERS has been hindered by the difficulty of realizing SERS substrates that provide reproducible SERS response over the whole active area. Here, we show that atomic layer deposition (ALD) grown iridium can be used to produce highly reliable SERS substrates. The substrates are based on a periodic array of high aspect-ratio iridium coated nanopillars that feature efficient and symmetrically distributed hot spots within the interpillar gaps (gap width<10 nm). We show that the enhancement with the iridium based nanostructures is of significant magnitude and it equals the enhancement of silver based reference substrates. Most notably, we demonstrate that the ordered and well-defined plasmonic nanopillars offer a measurement-to-measurement variability of 5%, which paves the way for truly quantitative SERS measurements.