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Dive into the research topics where Enrico Magni is active.

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Featured researches published by Enrico Magni.


Archive | 2013

Methods for verifying gas flow rates from a gas supply system into a plasma processing chamber

Dean J. Larson; Robert C. Hefty; James V. Tietz; Williams S. Kennedy; Eric Lenz; William M. Denty; Enrico Magni


Archive | 2004

Methods for protecting silicon or silicon carbide electrode surfaces from morphological modification during plasma etch processing

Kenji Takeshita; Tsuyoshi Aso; Seiji Kawaguchi; Thomas McClard; Wan-Lin Chen; Enrico Magni; Michael Kelly; Michelle Lupan; Robert C. Hefty


Archive | 2007

Sealed elastomer bonded Si electrodes and the like for reduced particle contamination in dielectric etch

Daxing Ren; Enrico Magni; Eric Lenz; Ren Zhou


Archive | 2005

Methods for silicon electrode assembly etch rate and etch uniformity recovery

Tuochuan Huang; Daxing Ren; Hong Shih; Catherine Zhou; Chun Yan; Enrico Magni; Bi Ming Yen; Jerome S. Hubacek; Dae J. Lim; Dougyong Sung


Archive | 2005

Methods for removing black silicon and black silicon carbide from surfaces of silicon and silicon carbide electrodes for plasma processing apparatuses

Enrico Magni; Michael Kelly; Robert C. Hefty; Michelle Lupan


Archive | 2003

Methods and apparatus for in situ substrate temperature monitoring by electromagnetic radiation emission

Enrico Magni


Archive | 2011

Method and apparatus for physical confinement of a liquid meniscus over a semiconductor wafer

Enrico Magni; Eric Lenz


Archive | 2011

Prevention of particle adders when contacting a liquid meniscus over a substrate

Enrico Magni; Suresh Gupta; Mark Gahagan; Eric Lenz; Mike Ravkin


Archive | 2009

Modifications to Surface Topography of Proximity Head

Enrico Magni; Robert J. O'Donnell; Jeffrey J. Farber


Archive | 2007

VERSIEGELTE Si-ELEKTRODEN MIT ELASTOMERBINDUNG UND DERGLEICHEN FÜR VERMINDERTE PARTIKELKONTAMINATION BEI DER DIELEKTRISCHEN ÄTZUNG

Daxing Ren; Enrico Magni; Eric Lenz; Ren Zhou

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