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Frederick P. Layman

Tokyo Electron

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Publication

Featured researches published by Frederick P. Layman.

Archive | 2001

High pressure processing chamber for semiconductor substrate

Maximilian A. Biberger; Frederick P. Layman; Thomas Robert Sutton

Archive | 2000

Method and apparatus for supercritical processing of multiple workpieces

Maximilian A. Biberger; Frederick P. Layman; Thomas Robert Sutton

Archive | 2008

Method and apparatus for making uniform and ultrasmall nanoparticles

Maximilian A. Biberger; Frederick P. Layman

Archive | 2008

Collecting particles from a fluid stream via thermophoresis

Frederick P. Layman; Maximilian A. Biberger

Archive | 2008

Shape of cone and air input annulus

Frederick P. Layman; Maximilian A. Biberger

Archive | 2002

High pressure processing chamber for multiple semiconductor substrates

Maximilian A. Biberger; Frederick P. Layman

Archive | 2008

Long cool-down tube with air input joints

Frederick P. Layman; Maximilian A. Biberger

Archive | 2008

Highly turbulent quench chamber

Maximilian A. Biberger; Frederick P. Layman

Archive | 2008

Water cooling system and heat transfer system

Frederick P. Layman; Maximilian A. Biberger

Archive | 2001

High pressure lift valve for use in semiconductor processing environment

Frederick P. Layman; Thomas Robert Sutton; Maximillian A. Biberger

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Maximilian A. Biberger

Tokyo Electron

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Thomas Robert Sutton

Tokyo Electron

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