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Maximilian A. Biberger

Tokyo Electron

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Publication

Featured researches published by Maximilian A. Biberger.

Archive | 2000

Removal of photoresist and residue from substrate using supercritical carbon dioxide process

William H. Mullee; Maximilian A. Biberger; Paul Schilling

Archive | 2001

Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module

Maximilian A. Biberger; Paul Schilling

Archive | 2005

Phase change based heating element system and method

Ronald Thomas Bertram; Joseph T. Hillman; Maximilian A. Biberger

Archive | 2001

High pressure processing chamber for semiconductor substrate

Maximilian A. Biberger; Frederick P. Layman; Thomas Robert Sutton

Archive | 2000

Method and apparatus for supercritical processing of multiple workpieces

Maximilian A. Biberger; Frederick P. Layman; Thomas Robert Sutton

Archive | 2002

High pressure compatible vacuum chuck for semiconductor wafer including lift mechanism

Thomas Robert Sutton; Maximilian A. Biberger

Archive | 2008

Method and apparatus for making uniform and ultrasmall nanoparticles

Maximilian A. Biberger; Frederick P. Layman

Archive | 2008

Collecting particles from a fluid stream via thermophoresis

Frederick P. Layman; Maximilian A. Biberger

Archive | 2008

Shape of cone and air input annulus

Frederick P. Layman; Maximilian A. Biberger

Archive | 2002

High pressure processing chamber for multiple semiconductor substrates

Maximilian A. Biberger; Frederick P. Layman

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Frederick P. Layman

Tokyo Electron

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Thomas Robert Sutton

Tokyo Electron

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Qinghua Yin

Umicore

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Bryant Kearl

Umicore

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Paul Schilling

Tokyo Electron

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Joseph T. Hillman

Tokyo Electron

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William H. Mullee

Tokyo Electron

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Qi Xiwang

Umicore

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