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Thomas Robert Sutton

Tokyo Electron

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Publication

Featured researches published by Thomas Robert Sutton.

Archive | 2001

High pressure processing chamber for semiconductor substrate

Maximilian A. Biberger; Frederick P. Layman; Thomas Robert Sutton

Archive | 2000

Method and apparatus for supercritical processing of multiple workpieces

Maximilian A. Biberger; Frederick P. Layman; Thomas Robert Sutton

Archive | 2002

High pressure compatible vacuum chuck for semiconductor wafer including lift mechanism

Thomas Robert Sutton; Maximilian A. Biberger

Archive | 2001

High pressure lift valve for use in semiconductor processing environment

Frederick P. Layman; Thomas Robert Sutton; Maximillian A. Biberger

Archive | 2001

Method and apparatus for agitation of workpiece in high pressure environment

Thomas Robert Sutton; Robert Koch

Archive | 2003

Apparatus for supercritical processing of a workpiece

Maximilian A. Biberger; Frederick P. Layman; Thomas Robert Sutton

Archive | 2002

High pressure processing chamber for semiconductor substrate including flow enhancing features

Maximilian A. Biberger; Frederick P. Layman; Thomas Robert Sutton

Archive | 2002

Method for supercritical processing of multiple workpieces

Maximilian A. Biberger; Frederick P. Layman; Thomas Robert Sutton

Archive | 2000

Method and apparatus for supercritical processing of a workpiece

Maximilian A. Biberger; Frederick P. Layman; Thomas Robert Sutton

Archive | 2003

Method of supercritical processing of a workpiece

Maximilian A. Biberger; Frederick P. Layman; Thomas Robert Sutton

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Frederick P. Layman

Tokyo Electron

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Maximilian A. Biberger

Tokyo Electron

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Robert Koch

Tokyo Electron

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