Gerry O’Sullivan

Rare-earth plasma extreme ultraviolet sources at 6.5–6.7 nm

We have demonstrated a laser-produced plasma extreme ultraviolet source operating in the 6.5–6.7 nm region based on rare-earth targets of Gd and Tb coupled with a Mo/B4C multilayer mirror. Multiply charged ions produce strong resonance emission lines, which combine to yield an intense unresolved transition array. The spectra of these resonant lines around 6.7 nm (in-band: 6.7 nm ±1%) suggest that the in-band emission increases with increased plasma volume by suppressing the plasma hydrodynamic expansion loss at an electron temperature of about 50 eV, resulting in maximized emission.

Optimizing 13.5nm laser-produced tin plasma emission as a function of laser wavelength

Extreme ultraviolet lithography requires a light source at 13.5nm to match the proposed multilayer optics reflectivity. The impact of wavelength and power density on the ion distribution and electron temperature in a laser-produced plasma is calculated for Nd:YAG and CO2 lasers. A steady-state figure of merit, calculated to optimize emission as a function of laser wavelength, shows an increase with a CO2 laser. The influence of reduced electron density in the CO2 laser-produced plasma is considered in a one-dimensional radiation transport model, where a more than twofold increase in conversion efficiency over that attainable with the Nd:YAG is predicted.

Simplified modeling of 13.5 nm unresolved transition array emission of a Sn plasma and comparison with experiment

One key aspect in the drive to optimize the radiative output of a laser-produced plasma for extreme ultraviolet lithography is the radiation transport through the plasma. In tin-based plasmas, the radiation in the 2% bandwidth at 13.5 nm is predominantly due to 4d-4f and 4p-4d transitions from a range of tin ions (Sn7+ to Sn12+). The complexity of the configurations involved in these transitions is such that a line-by-line analysis is, computationally, extremely intensive. This work seeks to model the emission profiles of each ion by treating the transition arrays statistically, thus greatly simplifying radiation transport modeling. The results of the model are compared with experimental spectra from tin-based laser-produced plasmas.

13.5nm extreme ultraviolet emission from tin based laser produced plasma sources

An examination of the influence of target composition and viewing angle on the extreme ultraviolet spectra of laser produced plasmas formed from tin and tin doped planar targets is reported. Spectra have been recorded in the 9–17nm region from plasmas created by a 700mJ, 15ns full width at half maximum intensity, 1064nm Nd:YAG laser pulse using an absolutely calibrated 0.25m grazing incidence vacuum spectrograph. The influence of absorption by tin ions (SnI–SnX) in the plasma is clearly seen in the shape of the peak feature at 13.5nm, while the density of tin ions in the target is also seen to influence the level of radiation in the 9–17nm region.

Feasibility study of broadband efficient “water window” source

We demonstrate a table-top broadband emission water window source based on laser-produced high-Z plasmas. Resonance emission from multiply charged ions merges to produce intense unresolved transition arrays (UTAs) in the 2–4 nm region, extending below the carbon K edge (4.37 nm). Arrays resulting from n=4-n=4 transitions are overlaid with n=4-n=5 emission and shift to shorter wavelength with increasing atomic number. An outline of a microscope design for single-shot live cell imaging is proposed based on a bismuth plasma UTA source, coupled to multilayer mirror optics.

Extreme ultraviolet source at 6.7 nm based on a low-density plasma

We demonstrate an efficient extreme ultraviolet (EUV) source for operation at λ = 6.7 nm by optimizing the optical thickness of gadolinium (Gd) plasmas. Using low initial density Gd targets and dual laser pulse irradiation, we observed a maximum EUV conversion efficiency (CE) of 0.54% for 0.6% bandwidth (BW) (1.8% for 2% BW), which is 1.6 times larger than the 0.33% (0.6% BW) CE produced from a solid density target. Enhancement of the EUV CE by use of a low-density plasma is attributed to the reduction of self-absorption effects.

Systematic investigation of self-absorption and conversion efficiency of 6.7 nm extreme ultraviolet sources

We have investigated the dependence of the spectral behavior and conversion efficiencies of rare-earth plasma extreme ultraviolet sources with peak emission at 6.7 nm on laser wavelength and the initial target density. The maximum conversion efficiency was 1.3% at a laser intensity of 1.6×1012 W/cm2 at an operating wavelength of 1064 nm, when self-absorption was reduced by use of a low initial density target. Moreover, the lower-density results in a narrower spectrum and therefore improved spectral purity. It is shown to be important to use a low initial density target and/or to produce low electron density plasmas for efficient extreme ultraviolet sources when using high-Z targets.

Optimizing conversion efficiency and reducing ion energy in a laser-produced Gd plasma

We have demonstrated an efficient extreme ultraviolet (EUV) source at 6.7 nm by irradiating Gd targets with 0.8 and 1.06 μm laser pulses of 140 fs to 10 ns duration. Maximum conversion efficiency of 0.4% was observed within a 0.6% bandwidth. A Faraday cup observed ion yield and time of flight signals for ions from plasmas generated by each laser. Ion kinetic energy was lower for shorter pulse durations, which yielded higher electron temperatures required for efficient EUV emission, due to higher laser intensity. Picosecond laser pulses were found to be the best suited to 6.7 nm EUV source generation.

Spectroscopy of highly charged ions and its relevance to EUV and soft x-ray source development

The primary requirement for the development of tools for extreme ultraviolet lithography (EUVL) has been the identification and optimization of suitable sources. These sources must be capable of producing hundreds of watts of extreme ultraviolet (EUV) radiation within a wavelength bandwidth of 2% centred on 13.5 nm, based on the availability of Mo/Si multilayer mirrors (MLMs) with a reflectivity of ~70% at this wavelength. Since, with the exception of large scale facilities, such as free electron lasers, such radiation is only emitted from plasmas containing moderately to highly charged ions, the source development prompted a large volume of studies of laser produced and discharge plasmas in order to identify which ions were the strongest emitters at this wavelength and the plasma conditions under which their emission was optimized. It quickly emerged that transitions of the type 4p64dn − 4p54dn+1 + 4dn−14f in the spectra of Sn IX to SnXIV were the best candidates and work is still ongoing to establish the plasma conditions under which their emission at 13.5 nm is maximized. In addition, development of other sources at 6.X nm, where X ~ 0.7, has been identified as the wavelength of choice for so-called Beyond EUVL (BEUVL), based on the availability of La/B based MLMs, with theoretical reflectance approaching 80% at this wavelength. Laser produced plasmas of Gd and Tb have been identified as potential source elements, as n = 4 − n = 4 transitions in their ions emit strongly near this wavelength. However to date, the highest conversion efficiency (CE) obtained, for laser to BEUV energy emitted within the 0.6% wavelength bandwidth of the available mirrors is only 0.8%, compared with values of 5% for the 2% bandwidth relevant for the Mo/Si mirrors at 13.5 nm. This suggests a need to identify other potential sources or the selection of other wavelengths for BEUVL. This review deals with the atomic physics of the highly-charged ions relevant to EUV emission at these wavelengths. It considers the developments that have contributed to the realization of the 5% CE at 13.5 nm which underpins the production of high-volume lithography tools, and those that will be required to realize BEUV lithography.

Prepulse-enhanced narrow bandwidth soft x-ray emission from a low debris, subnanosecond, laser plasma source

Soft x-ray emission from 170 ps laser-produced plasmas formed on cerium-doped borosilicate glasses has been recorded in the 7–17 nm region using a 2 m grazing incidence vacuum spectrograph. Broadband spectra have been recorded on photographic plates, while intensity comparisons have been made using an absolutely calibrated, extreme ultraviolet sensitive photodiode. The use of a laser prepulse to prime the target has been seen to enhance the emission with the maximum flux produced at an interpulse delay of 5.1 ns. The peak conversion efficiency is found to be 4.8%±1.5% into 3% bandwidth, centered at 8.8 nm. In addition, the level of debris emitted by the target is greatly reduced by comparison with solid metallic targets.