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Dive into the research topics where Han-Jun Kim is active.

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Featured researches published by Han-Jun Kim.


Journal of The Society for Information Display | 2009

Roll-to-roll manufacturing of electronics on flexible substrates using self-aligned imprint lithography (SAIL)

Han-Jun Kim; Marcia Almanza-Workman; Bob Garcia; Ohseung Kwon; Frank Jeffrey; Steve Braymen; Jason Hauschildt; Kelly Junge; Don Larson; Dan Stieler; Alison Chaiken; Bob Cobene; Richard Elder; Warren Jackson; Mehrban Jam; Albert Jeans; Hao Luo; Ping Mei; Craig Perlov; Carl Taussig

Abstract— The manufacture of large-area arrays of thin-film transistors on polymer substrates using roll-to-roll (R2R) processes exclusively is being developed. Self-aligned imprint lithography (SAIL) enables the patterning and alignment of submicron-sized features on meter-scaled flexible substrates in the R2R environment. SAIL solves the problem of precision interlayer registry on a moving web by encoding all the geometry information required for the entire patterning steps into a monolithic three-dimensional imprint with discrete thickness modulation. The pre-aligned multiple-step mask structure maintains its alignment regardless of subsequent substrate distortion. Challenges are encountered in relation to the novel nature of using flexible substrates and building toolsets for the R2R processing. In this paper, methods of the SAIL process, the resulting active-matrix backplanes, the trajectory of SAIL process development, and the remaining issues for production are presented.


Proceedings of SPIE | 2010

Advances in roll-to-roll imprint lithography for display applications

Albert Jeans; Marcia Almanza-Workman; Robert L. Cobene; Richard Elder; Robert A. Garcia; Fernando Gomez-Pancorbo; Warren Jackson; Mehrban Jam; Han-Jun Kim; Ohseung Kwon; Hao Luo; John Maltabes; Ping Mei; Craig Perlov; Mark T. Smith; Carl Taussig; Frank Jeffrey; Steve Braymen; Jason Hauschildt; Kelly Junge; Don Larson; Dan Stieler

A solution to the problems of roll-to-roll lithography on flexible substrates is presented. We have developed a roll-toroll imprint lithography technique to fabricate active matrix transistor backplanes on flexible webs of polyimide that have a blanket material stack of metals, dielectrics, and semiconductors. Imprint lithography produces a multi-level 3- dimensional mask that is then successively etched to pattern the underlying layers into the desired structures. This process, Self-Aligned Imprint Lithography (SAIL), solves the layer-to-layer alignment problem because all masking levels are created with one imprint step. The processes and equipment required for complete roll-to-roll SAIL fabrication will be described. Emphasis will be placed on the advances in the roll-to-roll imprint process which have enabled us to produce working transistor arrays.


SID Symposium Digest of Technical Papers | 2010

77.3: Invited Paper: Roll‐to‐Roll Manufacturing of Backplanes for Paper‐Like Displays

Carl Taussig; Robert L. Cobene; Richard Elder; Warren Jackson; Mehrban Jam; Albert Jeans; Hao Luo; John Maltabes; Ping Mei; Mark T. Smith; Craig Perlov; Lihua Zhao; Marcia Almanza-Workman; Robert A. Garcia; Han-Jun Kim; Ohseung Kwon; Frank Jeffrey

HP and Phicot are planning the worlds first R2R (roll-to-roll) manufacturing line for display backplanes based on the SAIL (Self-Aligned Imprint Lithography) process. Economic benefits for R2R compared to batch, cost comparisons of different R2R processes, comparison of substrate options, and necessary supply chain infrastructure developments are presented.


Proceedings of SPIE | 2011

Roll-to-roll fabrication and metastability in metal oxide transistors

Warren Jackson; Han-Jun Kim; Ohseung Kwon; Bao Yeh; Randy Hoffman; Devin Alexander Mourey; Tim Koch; Carl Taussig; Richard Elder; Albert Jeans

A roll-to-roll process is used to fabricate amorphous silicon and amorphous multicomponent oxide (MCO) transistors on flexible substrates using self aligned imprint lithography (SAIL). SAIL solves the layer to layer alignment problem. The imprint lithography patterned MCO transistors had a mobility of 15 cm2V-1 sec-1 and an on-off ratio of 107. Full display arrays with data, gate, hold capacitors and cross-overs were patterned using SAIL technology. Studies of stability of the MCO transistors indicate the importance of controlling O vacancies in the material particularly the back channel. Devices subjected to -10V gate bias stress at 60C under illumination exhibited behavior consistent with state creation in the upper and lower half of the gap near the back channel interface possibly associated with O vacancy formation.


device research conference | 2011

Defect analysis of roll-to-roll SAIL manufactured flexible display backplanes

Carl Taussig; Richard Elder; Warren Jackson; Albert Jeans; Mehrban Jam; Ed Holland; Hao Luo; John Maltabes; Craig Perlov; Steven W. Trovinger; Marcia Almanza-Workman; Robert A. Garcia; Han-Jun Kim; Ohseung Kwon; Frank Jeffrey

HP and Phicot have made the worlds first roll-to-roll (R2R) manufactured active matrix displays. Currently we are developing a wrist-worn solar powered display for the U.S. Army. As we scale from research to preproduction on our 1/3 meter wide pilot line defect analysis and mitigation is our primary focus. In this presentation we will review the self-aligned imprint lithography (SAIL) process and discuss defects we observe, and the tools, and processes we have developed to detect and eliminate them


SID Symposium Digest of Technical Papers | 2011

29.1: Invited Paper: Electrical Testing of Roll-to-Roll SAIL Manufactured Flexible Display Backplanes

Richard Elder; Warren Jackson; Mehrban Jam; Albert Jeans; Hao Luo; John Maltabes; Craig Perlov; Carl Taussig; Steven W. Trovinger; Fernando Gomez-Pancorbo; Marcia Almanza-Workman; Robert A. Garcia; Han-Jun Kim; Ohseung Kwon; Frank Jeffrey

HP and Phicot are making a fully roll-to roll fabricated display for a solar powered wrist display. We have developed methods for electrical testing of display backplanes on flexible substrates which are not bonded to a carrier. This has enabled improvement of yield through rapid electrical test feedback.


Archive | 2004

Method of forming at least one thin film device

Carl Taussig; Ping Mei; Han-Jun Kim


2007 International Conference on Semiconductor Technology for Ultra Large Scale Integrated Circuits and Thin Film Transistors (ULSIC vs. TFT) | 2007

Large Area Flexible Electronics Fabricated Using Self-Aligned Imprint Lithography

Warren B. Jackson; Marcia Almanza-Workman; Alison Chaiken; Robert A. Garcia; Albert Jeans; Han-Jun Kim; Ohseung Kwon; Hao Luo; Ping Mei; Craig Perlov; Carl Taussig; M. S. Shur; A. Koudymov


Proceedings of SPIE | 2012

Planarization coating for polyimide substrates used in roll-to-roll fabrication of active matrix backplanes for flexible displays

A. Marcia Almanza-Workman; Albert Jeans; Steve Braymen; Richard Elder; Robert A. Garcia; Alejandro de la Fuente Vornbrock; Jason Hauschildt; Edward Holland; Warren Jackson; Mehrban Jam; Frank Jeffrey; Kelly Junge; Han-Jun Kim; Ohseung Kwon; Don Larson; Hao Luo; John Maltabes; Ping Mei; Craig Perlov; Mark T. Smith; Dan Stieler; Carl Taussig; Steve Trovinger; Lihua Zhao


Journal of Non-crystalline Solids | 2006

Amorphous silicon memory arrays

Warren Jackson; Richard Elder; W. Hamburgen; Albert Jeans; Han-Jun Kim; Hao Luo; Ping Mei; Craig Perlov; Carl Taussig; Howard M. Branz; P. Stradin; Q. Wang; S. Ward; S. Braymen; F. Jeffery

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