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Dive into the research topics where Hans-Joerg Timme is active.

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Featured researches published by Hans-Joerg Timme.


Sensors and Actuators A-physical | 2000

Acceleration threshold switches from an additive electroplating MEMS process

Sven Michaelis; Hans-Joerg Timme; Michael Wycisk; Josef Binder

An acceleration threshold sensor fabricated with an electroplating technology on top of a CMOS signal processing circuit is presented in this paper. Manufacturing of the device is achieved using a standard low-cost CMOS production line and employing a specialized back-end process for adding the mechanical sensor-elements. This production technology makes the system especially interesting for automotive applications in airbag systems or transportation shock monitoring systems. These applications demand smaller size, improved functionality, high reliability and low costs, factors that can be satisfied with this new technology. The initial additive electroplating technology (AET) has been improved by coating the basic structures with an electroplated alloy. Additionally, a specialized packaging procedure has been developed to hermetically seal the sensor-structures following their release after the sacrificial layer removal. The devices are finally SMD-packaged to allow for easy handling. Samples of the device have been tested extensively and have successfully proven its functionality.


Asia Pacific Symposium on Microelectronics and MEMS | 1999

New sensor-on-chip technology for micromechanical acceleration-threshold switches

Michael Wycisk; Josef Binder; Sven Michaelis; Hans-Joerg Timme

This paper describes the development of a sensor for measuring acceleration-thresholds in the low-g range. The processing of the device is based on a new integration concept for MEMS called Additive Electroplating Technology (AET). This technology allows the integration of fixed and moveable electroplated microstructures on top of a standard ASIC by a low temperature back-end process. This permits the fabrication of the sensor on top of a CMOS signal processing circuit, where the development and the fabrication of the ASIC is absolutely independent of the following back-end process. In this context, the additive electroplating technology combines the advantages of monolithic- and hybrid-integrated sensor with respect to the reduction of interconnections, short development cycles, low tooling costs, and high design flexibility. A detailed technical concept for the fabrication of electroplated micromechanical acceleration switches is presented in this paper. It comprises the aspects of the interface technology between the ASIC and the sensor structure, the sensor fabrication and the back-end processing to capsulate the dies. The paper concludes with a characterization of the devices. The measured results are compared with the expected results of the simulation.


Archive | 2010

Semiconductor Devices and Methods of Manufacturing Thereof

Anton Mauder; Hans-Joachim Schulze; Hans-Joerg Timme; Franz Hirler; Francisco Javier Santos Rodriguez


Journal of the Acoustical Society of America | 2005

Piezoelectric resonator apparatus with acoustic reflector

Robert Aigner; Lueder Elbrecht; Stephan Marksteiner; Hans-Joerg Timme


Archive | 2007

Wafer and a Method for Manufacturing a Wafer

Hans-Joachim Schulze; Hans-Joerg Timme; Helmut Strack


Archive | 2002

Passivated baw resonator and baw filter

Robert Aigner; Guenter Ehrler; Lueder Elbrecht; Andreas Meckes; Winfried Nessler; Alfred Niklas; Hans-Joerg Timme


Archive | 2010

Method for producing a semiconductor

Anton Mauder; Hans-Joachim Schulze; Helmut Strack; Hans-Joerg Timme; Wolfgang Werner


Archive | 2014

Semiconductor substrate and a method of manufacturing the same

Hans-Joachim Schulze; Frank Pfirsch; Hans-Joerg Timme


Archive | 2013

Removable indicator structure in electronic chips of a common substrate for process adjustment

Edward Fuergut; Irmgard Escher-Poeppel; Manfred Engelhardt; Hans-Joerg Timme; Hannes Eder


Archive | 2011

METHOD FOR PROCESSING A SEMICONDUCTOR WAFER OR DIE, AND PARTICLE DEPOSITION DEVICE

Manfred Engelhardt; Hans-Joerg Timme; Ivan Nikitn; Manfred Frank; Thomas Kunstmann; Werner Robl; Guenther Ruhl

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