Is this you? Create Your Porfile
Avatar

Hauf Markus

Carl Zeiss AG

Network

Latest external collaboration on country level. Dive into details by clicking on the dots.

Explore More

Hotspot

Dive into the research topics where Hauf Markus is active.

Explore More

Publication

Featured researches published by Hauf Markus.

Archive | 2010

Optical assembly for use in microlithography projection exposure system of microchip, has supporting structure connected to mirror body via heat conducting section designed to discharge thermal power density of preset value to structure

Hauf Markus

Archive | 2009

Projection exposure apparatus for semiconductor lithography comprising a device for the thermal manipulation of an optical element

Hauf Markus; Bleidistel Sascha; Migura Sascha; Mann Hans-Juergen; Enkisch Hartmut; Zellner Johannes; Schottner Michael; Kraehmer Daniel; Totzeck Michael; Dodoc Aurelian; Hetzler Jochen; Beierl Helmut; Ulrich Wilhelm

Archive | 2011

Optical module for guiding extreme UV radiation beam in lighting system of microlithographic projection-illumination system, has central control unit in signal connection to integrated electronic displacement circuit

Hauf Markus; Waldis Severin; Noell Wilfried; Petremand Yves; Ataman Caglar

Archive | 2012

Anordnung zur Spiegeltemperaturmessung und/oder zur thermischen Aktuierung eines Spiegels in einer mikrolithographischen Projektionsbelichtungsanlage

Hauf Markus

Archive | 2014

Anordnung zur Aktuierung wenigstens eines optischen Elementes in einem optischen System

Hauf Markus; Vogler Alexander

Archive | 2014

BELEUCHTUNGSSYSTEM EINER MIKROLITHOGRAPHISCHEN PROJEKTIONSBELICHTUNGSANLAGE

Latzel Martin; Hauf Markus; Kwan Yim-Bun-Patrick; Xalter Stefan

Archive | 2013

LITHOGRAPHIEVORRICHTUNG MIT DÄMPFUNGSVORRICHTUNG

Vogler Alexander; Hauf Markus

Archive | 2013

Dämpfungsanordnung zur Dissipation von Schwingungsenergie eines Elementes in einem System, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage

Hauf Markus

Archive | 2012

Anordnung zur Aktuierung eines Elementes in einer Projektionsbelichtungsanlage

Hauf Markus; Schoenhoff Ulrich

Archive | 2016

Einrichtung zur Verschwenkung eines Spiegel-Elements mit zwei Schwenk-Freiheitsgraden

Hauf Markus; Sarov Yanko

Explore More

Collaboration

Dive into the Hauf Markus's collaboration.

Top Co-Authors
Avatar

Bleidistel Sascha

Carl Zeiss AG

View shared research outputs
Top Co-Authors
Avatar

Latzel Martin

Carl Zeiss AG

View shared research outputs
Top Co-Authors
Avatar

Sarov Yanko

Carl Zeiss AG

View shared research outputs
Top Co-Authors
Avatar

Hartjes Joachim

Carl Zeiss AG

View shared research outputs
Top Co-Authors
Avatar

Schoenhoff Ulrich

Carl Zeiss AG

View shared research outputs
Top Co-Authors
Avatar

Vogler Alexander

Carl Zeiss AG

View shared research outputs
Top Co-Authors
Avatar

Buis Edwin Johan

Carl Zeiss AG

View shared research outputs
Top Co-Authors
Avatar

Gruner Toralf

Carl Zeiss AG

View shared research outputs
Top Co-Authors
Avatar

Horn Jan

Carl Zeiss AG

View shared research outputs
Top Co-Authors
Avatar

Schwab Markus

Carl Zeiss AG

View shared research outputs
Explore More
Researchain Logo
Decentralizing Knowledge