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Horn Jan

Carl Zeiss AG

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Publication

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Archive | 2014

Verfahren zur Regelung der Verkippung eines Spiegelelements

Horn Jan; Berger Lars; Hartmann Matthias; Knauf Benedikt; Orth Matthias; Waldis Severin

Archive | 2010

Measuring system for determining the position of a reflective optical component in a micro-lithography projection illumination facility has a unit as a source of light to measure rays

Ehm Dirk Heinrich; Kampen Maarten Van; Schmidt Stefan-Wolfgang; Moors Johannes Hubertus Josephina; Horn Jan

Archive | 2018

VORRICHTUNG ZUR ÜBERTRAGUNG VON ELEKTRISCHEN SIGNALEN SOWIE LITHOGRAPHIEANLAGE

Horn Jan; Bleidistel Sascha; Bart Florian; Hauf Markus

Archive | 2018

리소그래피 시스템의 다수의 미러의 각각의 위치를 결정하기 위한 센서 조립체 및 방법

Horn Jan; Krone Stefan; Berger Lars

Archive | 2018

DEVICE FOR TRANSMITTING ELECTRICAL SIGNALS, AND LITHOGRAPHY SYSTEM

Horn Jan; Bleidistel Sascha; Bart Florian; Hauf Markus

Archive | 2018

MULTI-MIRROR ARRAY

Horn Jan; Tuerk Stefan; Noordman Oscar; Bihr Ulrich

Archive | 2017

특히 마이크로리소그래픽 투영 노광 장치의 광학 시스템의 조립체

Horn Jan; Solaiman Mostafa; Sigel Benjamin; Knauf Benedikt; Krone Stefan; Specht Joerg; Holz Markus; Bleidistel Sascha; Bart Florian

Archive | 2017

Sensoranordnung für eine Lithographieanlage, Lithographieanlage und Verfahren zum Betreiben einer Lithographieanlage

Bihr Ulrich; Holz Markus; Horn Jan

Archive | 2016

Vorrichtung und Verfahren zur aktiven Dämpfung zumindest eines Spiegels einer Lithographieanlage

Horn Jan; Hauf Markus; Eisenmenger Johannes; Orth Matthias; Krone Stefan

Archive | 2016

DEVICE FOR DETERMINING A TILT ANGLE OF AT LEAST ONE MIRROR OF A LITHOGRAPHY SYSTEM, AND METHOD

Horn Jan; Holz Markus; Specht Joerg

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Collaboration

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Holz Markus

Carl Zeiss AG

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Krone Stefan

Carl Zeiss AG

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Knauf Benedikt

Carl Zeiss AG

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Sigel Benjamin

Carl Zeiss AG

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Specht Jörg

Carl Zeiss AG

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Berger Lars

Carl Zeiss AG

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Bihr Ulrich

Carl Zeiss AG

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Bleidistel Sascha

Carl Zeiss AG

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Hauf Markus

Carl Zeiss AG

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Lindner Ralf

Carl Zeiss AG

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