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Helene Prigge

Hess Corporation

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Publication

Featured researches published by Helene Prigge.

Archive | 1988

Process and apparatus for etching semiconductor surfaces

Anton Schnegg; Gerhard Dr. Dipl.-Ing. Brehm; Helene Prigge; Robert Rurlander; Fritz Dr. Dipl.-Che. Ketterl

Archive | 1988

Method of haze-free polishing for semiconductor wafers

Helene Prigge; Anton Schnegg; Gerhard Dr. Dipl.-Ing. Brehm; Herbert Jacob

Journal of The Electrochemical Society | 1991

Acceptor Compensation in Silicon Induced by Chemomechanical Polishing

Helene Prigge; Peter Gerlach; Peter O. Hahn; Anton Schnegg; Herbert Jacob

Archive | 1990

Process for removing gaseous contaminating compounds from carrier gases containing halosilane compounds

Helene Prigge; Robert Rurlander; Harald Hoffman; Hans-Peter Bortner

Archive | 1989

Process for preserving the surface of silicon wafers

Helene Prigge; Anton Schnegg; Gerhard Dr. Dipl.-Ing. Brehm

Archive | 1990

Process and apparatus for double-sided chemomechanical polishing of semiconductor wafers and semiconductor wafers obtainable thereby

Helene Prigge; Josef Lang

Archive | 1990

Process for treating polishing cloths used for semiconductor wafers

Helene Prigge; Josef Lang

Archive | 1990

Process for the surface treatment of semiconductor slices

Gerhard Dr. Dipl.-Ing. Brehm; Helene Prigge; Reinhold Wahlich

Archive | 1989

Process for removing n-type impurities from liquid or gaseous substances produced in the gas-phase deposition of silicon

Helene Prigge; Robert Rurlander; Michael Schwab; Hans Peter Dipl Chem D Bortner; Andreas Englmuller

Archive | 1988

Method to polish semiconductor wafer without streaks

Helene Prigge; Anton Schnegg; Gerhard Dr. Dipl.-Ing. Brehm; Herbert Jacob

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Collaboration

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Anton Schnegg

Hess Corporation

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Gerhard Dr. Dipl.-Ing. Brehm

Hess Corporation

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Robert Rurlander

Hess Corporation

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Herbert Jacob

Hess Corporation

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Fritz Dr. Dipl.-Che. Ketterl

Hess Corporation

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Josef Lang

Hess Corporation

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Robert Rurlaender

Hess Corporation

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