Is this you? Create Your Porfile
Avatar

Hiroaki Kakiuchi

Hitachi

Network

Latest external collaboration on country level. Dive into details by clicking on the dots.

Explore More

Hotspot

Dive into the research topics where Hiroaki Kakiuchi is active.

Explore More

Publication

Featured researches published by Hiroaki Kakiuchi.

Archive | 2005

Method of manufacturing epitaxial silicon film and plasma processing apparatus

Hiroaki Kakiuchi; Hiromasa Oomi; Heiji Watabe; Kiyoshi Yasutake; 弘章 垣内; 宏昌 大参; 潔 安武; 平司 渡部

Archive | 2006

PROCESS FOR PRODUCING FILM USING ATMOSPHERIC PRESSURE HYDROGEN PLASMA, AND METHOD AND APPARATUS FOR PRODUCING PURIFICATION FILM

Hiromasa Ohmi; Kiyoshi Yasutake; Hiroaki Kakiuchi

Archive | 2007

Plasma processing apparatus and method, gas generating device and method, and fluorine-contained polymer waste disposal method

Hiroaki Kakiuchi; Hiromasa Oomi; Kiyoshi Yasutake; 弘章 垣内; 宏昌 大参; 潔 安武

Archive | 2006

Film Producing Method Using Atmospheric Pressure Hydrogen Plasma, and Method and Apparatus for Producing Refined Film

Hiromasa Ohmi; Kiyoshi Yasutake; Hiroaki Kakiuchi

Archive | 2012

Atmospheric Pressure Plasma Processing Apparatus

Hiroyuki Kobayashi; Hiroaki Kakiuchi; Kiyoshi Yasutake

Journal of the Japan Society for Precision Engineering, Contributed Papers | 2004

Study on the Crucial Factors for Deposition Rate in the High-rate Deposition Process of Polycrystalline Silicon Films by Atmospheric Pressure Plasma CVD

Hiromasa Ohmi; Hiroaki Kakiuchi; Kiyoshi Yasutake; Yasuji Nakahama; Yusuke Ebata; Kumayasu Yoshii; Yuzo Mori

Proceedings of JSPE Semestrial Meeting | 2012

High rate formation and characterization of ZnO thin films using atmospheric-Pressure Radio-Frequency Plasma

Yusuke Mizuno; Shuta Mine; Takahiro Yamada; Hiromasa Ohmi; Hiroaki Kakiuchi; Kiyoshi Yasutake

Archive | 2012

Atmosphärendruck-Plasmabearbeitungsvorrichtung Atmospheric pressure plasma processing apparatus

Hiroaki Kakiuchi; Hiroyuki Kobayashi; Kiyoshi Yasutake

Proceedings of JSPE Semestrial Meeting | 2009

Si Selective Epitaxial Growth by Atmospheric Pressure Plasma CVD

Takayuki Ohnishi; Yutaka Kirihata; Hiromasa Ohmi; Hiroaki Kakiuchi; Kiyoshi Yasutake

應用物理 | 2007

Low-temperature and high-rate growth of epitaxial silicon by atmospheric-pressure plasma chemical vapor deposition

Kiyoshi Yasutake; Hiroaki Kakiuchi; Hiromasa Ohmi

Explore More

Collaboration

Dive into the Hiroaki Kakiuchi's collaboration.

Top Co-Authors
Avatar

Kiyoshi Yasutake

IBM

View shared research outputs
Top Co-Authors
Avatar

Hiromasa Ohmi

Osaka University

View shared research outputs
Top Co-Authors
Avatar

Kumayasu Yoshii

Osaka University

View shared research outputs
Top Co-Authors
Avatar

Yuzo Mori

Osaka University

View shared research outputs
Top Co-Authors
Avatar

Yasuji Nakahama

National Archives and Records Administration

View shared research outputs
Top Co-Authors
Avatar

Yusuke Ebata

National Archives and Records Administration

View shared research outputs
Top Co-Authors
Avatar

Hiroyuki Kobayashi

Hitachi

View shared research outputs
Top Co-Authors
Avatar

Kiyoshi Yasutake

IBM

View shared research outputs
Top Co-Authors
Avatar

Takahiro Yamada

Osaka University

View shared research outputs
Top Co-Authors
Avatar

Takayuki Ohnishi

Osaka University

View shared research outputs
Explore More
Researchain Logo
Decentralizing Knowledge