Hirohisa Kikuyama
Tohoku University
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Publication
Featured researches published by Hirohisa Kikuyama.
IEEE Transactions on Electron Devices | 1990
Nobuhiro Miki; Hirohisa Kikuyama; Ichiroh Kawanabe; Masayuki Miyashita; Tadahiro Ohmi
Gas-phase selective etching of native oxide film formed on a silicon surface is an essential requirement for ULSI process technologies. Ultraclear anhydrous hydrogen fluoride (AHF) gas and a corrosion-free system were developed for this etching process. The reaction mechanism of silicon oxide film with moistureless HF was investigated, and selective etching conditions were developed. The gas-phase selective etching of native oxide in an environment of strictly controlled AHF concentration in N/sub 2/ is described. >
Archive | 1987
Tadahiro Ohmi; Nobuhiro Miki; Hirohisa Kikuyama
Archive | 1989
Tadahiro Ohmi; Masahiro Miki; Hirohisa Kikuyama; Matagoro Maeno
Archive | 1993
Tadahiro Ohmi; Masahiro Miki; Hirohisa Kikuyama
Archive | 2005
Kazuyuki Tohji; Yashinori Satoh; Hirohisa Kikuyama; Masahide Waki; Shiniji Hashiguchi; Yasutaka Tashiro
Archive | 1995
Matagoro Maeno; Masayuki Miyashita; Hirohisa Kikuyama; Tatsuhiro Yabune; Jun Takano; Hirofumi Fukui; Satoshi Miyazawa; Chisato Iwasaki; Tadahiro Ohmi; Yasuhiko Kasama; Hitoshi Seki
Archive | 2002
Hirohisa Kikuyama; Tatsuhiro Yabune; Masayuki Miyashita; Tadahiro Ohmi
Archive | 1991
Tadahiro Ohmi; Masahiro Miki; Hirohisa Kikuyama; Matagoro Maeno
Archive | 1989
Tadahiro Ohmi; Masahiro Miki; Hirohisa Kikuyama; Matagoro Maeno
Archive | 2003
Hirohisa Kikuyama; Toshirou Fukudome; Masahide Waki; Hirofumi Yazaki
