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IEEE Transactions on Components, Hybrids, and Manufacturing Technology | 1989

Development of a coated wire bonding technology

Susumu Okikawa; Michio Tanimoto; Hiroshi Watanabe; Hiroshi Mikino; Tsuyoshi Kaneda

A coated wire bonding technique is proposed where unnecessary coating film is removed by arc heat synchronously with ball formation after which the wire is bonded with the chip (first bonding). The wire is then bonded on a lead while the coating film is removed by ultrasonic energy and excess heat (second handling). Highly heat-resistant polyurethane is the optimum material for satisfying the requirements of no carbonization by heat during ball formation and no heat deterioration. The gas-blowing method for ball formation is effective in preventing the capillary from becoming contaminated or clogged. Short-time discharge is effective in reducing the amount of melted coating film immediately above a ball. An average voltage resistance of insulation of 850 V and a thickness of about 1.0 mu m are sufficient for the coating film to obtain satisfactory bondability and good reliability. This insulation coating film (applied to Au wire surfaces) prevents short circuits, even if wires touch. This technology facilitates the manufacture of multipin ASIC (application-specific IC) devices. >


Archive | 1989

Semiconductor integrated circuit device, method for producing or assembling same, and producing or assembling apparatus for use in the method

Tsuyoshi Kaneda; Susumu Okikawa; Hiroshi Mikino; Hiroshi Watanabe; Toshihiro Satou; Atsushi Onodera; Michio Tanimoto


Archive | 1977

Resin-sealed type semiconductor devices and manufacturing method of the same

Susumu Okikawa; Hiroshi Mikino


Archive | 1976

Method of providing semiconductor pellet with heat sink

Susumu Okikawa; Osamu Yukawa; Hiroshi Mikino; Yoshio Nonaka


Archive | 1994

Heat-resistant coating material and bonding wire coated therewith

Takeaki Abe; Yukiharu Akiyama; Takehiko Ebara; Kuniyuki Eguchi; Hiroshi Mikino; Masanori Segawa; Kunihiro Tsubosaki; Hiroshi Watanabe; 博 三木野; 邦宏 坪崎; 武明 安倍; 州志 江口; 宏 渡辺; 正則 瀬川; 雪治 秋山; 武彦 荏原


Archive | 1985

DISPOSITIVO A SEMICONDUTTORI COMPRENDENTE UNA PALLINA,FILI CONDUTTORI E PORZIONI CONDUTTRICI ESTERNE CHE SONO COLLEGATE ALLA PALLINA MEDIANTE TALI FILI CONDUTTORI

Susumu Okikawa; Hiroshi Mikino; Hiromichi Suzuki; Wahei Kitamura; Daiji Sakamoto


Archive | 1985

Connection son of a semiconductor wafer, in particular encapsulated in resin

Susumu Okikawa; Hiroshi Mikino; Hiromichi Suzuki; Wahei Kitamura; Daiji Sakamoto


Archive | 1985

Ep a1 0101299

Susumu Okikaway; Hiroshi Mikino; Hiromichi Suzuki; Wahei Kitamura; Daiji Sakamoto


Archive | 1985

Connection wires for a semiconducting chip, in particular encapsulated beneath resin

Susumu Okikawa; Hiroshi Mikino; Hiromichi Suzuki; Wahei Kitamura; Daiji Sakamoto


Archive | 1985

A semiconductor device. electric connecting pads and elements of wiring has a copper wire

Susumu Okikawa; Hiroshi Mikino; Hiromichi Suzuki; Wahei Kitamura

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