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Dive into the research topics where Hisao Watarai is active.

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Featured researches published by Hisao Watarai.


Japanese Journal of Applied Physics | 1992

Electric Properties of SrTiO3 Thin Films Prepared by RF Sputtering

Takeharu Kuroiwa; Toshihisa Honda; Hisao Watarai; Ken Sato

Dielectric SrTiO 3 thin films have been prepared on Pt/SiO 2 /Si-wafer by means of a conventional rf-magnetron sputtering technique. Electric and dielectric properties of the films have been studied. It is demonstrated that the leakage current of the films is strongly dependent on the atmosphere during deposition. The SrTiO 3 film 75 nm in thickness fabricated in pure O 2 of 26.6 Pa at 600°C obtained the lowest leakage current density of 4.0×10 −9 A/cm 2 at 2 V. Analysis of the leakage current vs applied voltage characteristic indicated that the conduction in the higher electric field was due to the Pool-Frenkel emission


Japanese Journal of Applied Physics | 1991

The Effect of Mn Addition on Dielectric Properties and Microstructure of BaO-Nd2O3-TiO2 Ceramics

Akira Yamada; Yoshikazu Utsumi; Hisao Watarai

The dielectric properties and microstructures were investigated in ceramics of BaONd2O35TiO2 to which various amounts of Mn were added. Although the behavior of the dielectric constant was independent of additional Mn, the temperature coefficient was improved considerably. The phases which were observed in these ceramics were characterized by means of electron probe microanalysis (EPMA) and X-ray diffraction method (XRD) in microareas. The shapes and areas of the phases varied with Mn content. The dielectric properties seemed to be mainly related to the properties of the matrix phase.


Japanese Journal of Applied Physics | 1992

Preparation of Sr(Zr, Ti)O3 Ceramics and Their Dielectric Properties at Microwave Frequencies

Akira Yamada; Yoshikazu Utsumi; Hisao Watarai; Ken Sato

Powder of the dielectric ceramic Sr(Zr, Ti)O 3 was prepared by a new chemical method using TiO 2 powder. The obtained fine and well-dispersed powder had good sinterability. The microscopic compositional uniformity in the sintered body was estimated by WDX, and the dielectric properties were measured at 6 GHz and 1 MHz. The samples prepared by the chamical method had excellent uniformity and a Q value (1/tan δ) 2.5 times that of the samples prepared by the conventional method


Archive | 1994

Infrared detecting element

Akira Yamada; Takehiko Sato; Yoshikazu Utsumi; Hisao Watarai


Archive | 1993

Method of manufacturing an oxide-system dielectric thin film using CVD method

Fusaoki Uchikawa; Shigeru Matsuno; Shinichi Kinouchi; Toshihisa Honda; Takeharu Kuroiwa; Hisao Watarai; Takashi Higaki


Archive | 1995

CVD Raw Material for oxide-system dielectric thin film and capacitor produced by CVD method using the CVD raw material

Fusaoki Uchikawa; Shigeru Matsuno; Shinichi Kinouchi; Hisao Watarai


Archive | 1993

Infrared detection element array and method for fabricating the same

Yoshikazu Utsumi; Akira Yamada; Masatomi Okumura; Hisao Watarai; Ken Sato; Takehiko Sato; Yuichi Sakai


Archive | 1993

Infrared detector array and production method therefor

Yoshikazu Utsumi; Akira Yamada; Masatomi Okumura; Hisao Watarai; Ken Sato; Takehiko Sato; Yuichi Sakai


Archive | 1981

Moisture sensitive element containing high temperature decomposition residue of organo-silicon polymer as sensitive element

Fusaoki Uchikawa; Morihisa Takeuchi; Kozo Shimamoto; Kunihiko Miyao; Kimio Momiyama; Hisao Watarai


Archive | 1996

CVD method for forming oxide-system dielectric thin film

Fusaoki Uchikawa; Shigeru Matsuno; Shinichi Kinouchi; Hisao Watarai

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