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Featured researches published by Shigeru Matsuno.


optical fiber communication conference | 2001

Tunable dispersion equalizer with a divided thin film heater

Sadayuki Matsumoto; Takuya Ohira; Masakazu Takabayashi; Junichiro Hoshizaki; Hajime Takeya; Shigeru Matsuno; Kiichi Yoshiara; Takashi Sugihara; Katsuhiro Shimizu; Yukio Kobayashi; Minoru Hashimoto; Shinichi Takagi; Toshiya Murakami

We developed tunable dispersion equalizer with a chirped fiber grating and a divided thin film heater composed thirty-two thin film heaters. The divided thin film heater took an important role in the control of dispersion and dispersion slope, moreover the correction of group delay ripples. We successfully demonstrated the dispersion change from -304 ps/nm to -196 ps/nm and the dispersion slope change from +100 ps/nm/sup 2/ to -300 ps/nm/sup 2/.


optical fiber communication conference | 2003

Tunable polarization mode dispersion compensator with chirped fiber Bragg gratings

Kiichi Yoshiara; Masakazu Takabayashi; Sadayuki Matsumoto; Takuya Ohira; Junichiro Hoshizaki; Shigeru Matsuno; Takashi Sugihara; Takashi Mizuochi; Ken Matsuoka; Takashi Hashimoto

We have developed tunable polarization mode dispersion (PMD) compensators and successfully demonstrated to change differential group delay (DGD) from several ps to 90 ps and to compensate DGD in 43 Gbit/s RZ optical transmission experiment.


Archive | 1988

Plasma based method for production of superconductive oxide layers

Shigeru Matsuno; Yoshio Kubo; Kiyoshi Yoshizaki; Mitsunobu Wakata; Syouji Miyashita; Fumio Fujiwara


Archive | 2006

Variable dispersion compensator

Takuya Ohira; Sadayuki Matsumoto; Kiichi Yoshiara; Masakazu Takabayashi; Junichiro Hoshizaki; Shigeru Matsuno; Ryosuke Namiki; Takashi Hashimoto


Archive | 2001

Chemical vapor deposition apparatus and a method of manufacturing a semiconductor device

Mikio Yamamuka; Takaaki Kawahara; Masayoshi Tarutani; Tsuyoshi Horikawa; Shigeru Matsuno; Takehiko Sato


Archive | 1993

Method of manufacturing an oxide-system dielectric thin film using CVD method

Fusaoki Uchikawa; Shigeru Matsuno; Shinichi Kinouchi; Toshihisa Honda; Takeharu Kuroiwa; Hisao Watarai; Takashi Higaki


Archive | 1995

CVD Raw Material for oxide-system dielectric thin film and capacitor produced by CVD method using the CVD raw material

Fusaoki Uchikawa; Shigeru Matsuno; Shinichi Kinouchi; Hisao Watarai


Archive | 1999

Vaporizer for chemical vapor deposition apparatus, chemical vapor deposition apparatus, and semiconductor device manufactured thereby

Masayoshi Tarutani; Tsuyoshi Horikawa; Takaaki Kawahara; Mikio Yamamuka; Shigeru Matsuno; Takehiko Sato


Archive | 2001

Polarization dispersion compensating apparatus

Masakazu Takabayashi; Sadayuki Matsumoto; Takuya Ohira; Kiichi Yoshiara; Junichiro Hoshizaki; Hajime Takeya; Shigeru Matsuno


Archive | 2001

Method of forming high dielectric constant thin film and method of manufacturing semiconductor device

Takaaki Kawahara; Mikio Yamamuka; Tsuyoshi Horikawa; Masayoshi Tarutani; Takehiko Sato; Shigeru Matsuno

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