Junyoung Kang

Plasma Textured Glass Surface Morphologies for Amorphous Silicon Thin Film Solar Cells-A review

Copyright ©2016 KIEEME. All rights reserved. This is an open-access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/by-nc/3.0) which permits unrestricted noncommercial use, distribution, and reproduction in any medium, provided the original work is properly cited. pISSN: 1229-7607 eISSN: 2092-7592 DOI: http://dx.doi.org/10.4313/TEEM.2016.17.2.98 OAK Central: http://central.oak.go.kr

High Efficiency Inorganic/Inorganic Amorphous Silicon/Heterojunction Silicon Tandem Solar Cells

We investigated high-efficiency two-terminal tandem photovoltaic (PV) devices consisting of a p/i/n thin film silicon top sub-cell (p/i/n-TFS) and a heterojunction with an intrinsic thin-layer (HIT) bottom sub-cell. We used computer simulations and experimentation. The short-circuit current density (Jsc) of the top sub-cell limits the Jsc of the p/i/n-TFS/HIT tandem PV device. In order to improve the Jsc of the top sub-cell, we used a buffer-layer at the p/i and i/n interface and a graded forward-profile (f-p) band gap hydrogenated amorphous silicon germanium active layer, namely i-layer, in the top sub-cell. These two approaches showed a remarkable raise of the top sub-cell’s Jsc, leading to the increase of the Jsc of the PV tandem device. Furthermore, in order to minimize the optical loss, we employed a double-layer anti-reflective coating (DL-ARC) with a magnesium fluoride/indium tin oxide double layer on the front surface. The reduction in broadband reflection on the front surface (with the DL-ARC) and the enhanced optical absorption in the long wavelength region (with the graded f-p band gap) resulted in the high Jsc, which helped achieve the efficiency up to 16.04% for inorganic-inorganic c-Si-based tandem PV devices.

Study on the Structural and Mechanical Characteristics of ITO Films Deposited by Pulsed DC Magnetron Sputtering

The mechanical properties of ITO films such as adhesion and internal stress are very important for the commercial application of solar cell devices. We report high quality pulsed DC magnetron sputtered ITO films deposited on silicon and glass substrates with low resistivity and high transmittance for various working pressures ranging from 0.96 to 3.0 mTorr. ITO films showed the lowest resistivity of 2.68×10-4 Ω·cm, high hall mobility of 46.89 cm2/V.s, and high transmittance (>85%) for the ITO films deposited at a low working pressure of 0.99 mTorr. The ITO films deposited at a low working (0.96 mTorr) pressure had both amorphous and polycrystalline structures and were found to have compressive stress while the ITO films deposited at higher temperature than 0.99 mTorr was mixture of amorphous and polycrystalline and was found to have tensile stress.