Hyun-Min Seung

Flexible conductive-bridging random-access-memory cell vertically stacked with top Ag electrode, PEO, PVK, and bottom Pt electrode

Flexible conductive-bridging random-access-memory (RAM) cells were fabricated with a cross-bar memory cell stacked with a top Ag electrode, conductive polymer (poly(n-vinylcarbazole): PVK), electrolyte (polyethylene oxide: PEO), bottom Pt electrode, and flexible substrate (polyethersulfone: PES), exhibiting the bipolar switching behavior of resistive random access memory (ReRAM). The cell also exhibited bending-fatigue-free nonvolatile memory characteristics: i.e., a set voltage of 1.0 V, a reset voltage of -1.6 V, retention time of >1 × 10(5) s with a memory margin of 9.2 × 10(5), program/erase endurance cycles of >10(2) with a memory margin of 8.4 × 10(5), and bending-fatigue-free cycles of ∼1 × 10(3) with a memory margin (I(on)/I(off)) of 3.3 × 10(5).

Fabricated nonvolatile memory with Ag nano-crystals embedded in PVK

We have been researching the polymer nonvolatile memory-cell based on electrical bi-stability. The polymer nonvolatile memory-cell was the 4F² embedded with Ag nano-crystals in conductive polymer. The structure of polymer nonvolatile memory-cell was PVK(poly(N-vinylcarbazole) / Ag nano-crystals / PVK between the Al electrodes. The Ag nano-crystals were formed by using the curing process after evaporate several nanometers of Ag layer. The polymer nonvolatile memory-cell embedded with Ag nano-crystals showed the memory magin(ratio of I<inf>on</inf> to I<inf>off</inf>) is ∼5.0×10¹. The retention time is more than 10⁵ seconds.